1998
DOI: 10.1016/s0257-8972(97)00363-0
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Emission actinometric investigations of atomic hydrogen and CH radicals in plasma-enhanced chemical vapour deposition processes of hexamethyldisiloxane

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Cited by 6 publications
(3 citation statements)
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“…18,19 Using hexamethyldisiloxane ͓HMDSO: ͑CH 3 ͒ 3 SiOSi͑CH 3 ͒ 3 ͔ to evaluate the deposition of plasma films has some advantages: (i) The liquid precursor is easy to handle (nontoxic, high vapor pressure) and (ii) it is used from many plasma groups all around the world. [20][21][22][23][24][25][26][27][28][29] Therefore, we examine the deposition rates of HMDSO plasmas as a standard process to compare different plasma reactor setups and to get insights for controlling the degree of retention of molecular structure, functional groups, and elemental composition to design functional coatings. For example, the control of the residual hydrocarbon content in SiOC:H films deposited from HMDSO enables the adjustment of film properties, such as hardness, 30,31 internal stresses, 20,32 abrasion resistance, 33,34 elasticity, 30,31 wettability, 20,31,32,35 biocompatibility, 35,36 as well as protective, 23,37 optical, 20,23 barrier, [38][39][40] diffusion, 41 and sorption properties.…”
Section: Standard Processmentioning
confidence: 99%
“…18,19 Using hexamethyldisiloxane ͓HMDSO: ͑CH 3 ͒ 3 SiOSi͑CH 3 ͒ 3 ͔ to evaluate the deposition of plasma films has some advantages: (i) The liquid precursor is easy to handle (nontoxic, high vapor pressure) and (ii) it is used from many plasma groups all around the world. [20][21][22][23][24][25][26][27][28][29] Therefore, we examine the deposition rates of HMDSO plasmas as a standard process to compare different plasma reactor setups and to get insights for controlling the degree of retention of molecular structure, functional groups, and elemental composition to design functional coatings. For example, the control of the residual hydrocarbon content in SiOC:H films deposited from HMDSO enables the adjustment of film properties, such as hardness, 30,31 internal stresses, 20,32 abrasion resistance, 33,34 elasticity, 30,31 wettability, 20,31,32,35 biocompatibility, 35,36 as well as protective, 23,37 optical, 20,23 barrier, [38][39][40] diffusion, 41 and sorption properties.…”
Section: Standard Processmentioning
confidence: 99%
“…Comparing other recorded gases (N, H 2 O, He, and H 2 with available hydrocarbon [C x H y ]) with the same setup at a wavelength of 431 nm shows that the highest intensity is obtained in the presence of hydrocarbons, and therefore could signify a C x H y species, most likely CH [11][12][13] (figure 4(a)). Two concentrations have been considered for H 2 O, as the behavior of H 2 O samples is quite different as compared to other gases, which is outside the scope of this study.…”
Section: Experimental Methodsmentioning
confidence: 99%
“…However, there have been few investigations into low-temperature plasma interactions with hydrocarbon molecules at atmospheric pressure. In our recent paper [1], plasma modeling provides evidence for limited dissociation, whereas algorithm detection of methane is based on both indirect mechanisms through plasma interaction with impurities, and on low-intensity carbon species emission-namely CH and C 2-the former producing an identifiable emission line at 431 nm [10][11][12][13]. In recent years, few techniques proposed to detect hydrocarbons and gas impurities in the form of molecular using Glow discharge and kinetics of fast electrons [14,15].…”
Section: Hementioning
confidence: 99%