“…18,19 Using hexamethyldisiloxane ͓HMDSO: ͑CH 3 ͒ 3 SiOSi͑CH 3 ͒ 3 ͔ to evaluate the deposition of plasma films has some advantages: (i) The liquid precursor is easy to handle (nontoxic, high vapor pressure) and (ii) it is used from many plasma groups all around the world. [20][21][22][23][24][25][26][27][28][29] Therefore, we examine the deposition rates of HMDSO plasmas as a standard process to compare different plasma reactor setups and to get insights for controlling the degree of retention of molecular structure, functional groups, and elemental composition to design functional coatings. For example, the control of the residual hydrocarbon content in SiOC:H films deposited from HMDSO enables the adjustment of film properties, such as hardness, 30,31 internal stresses, 20,32 abrasion resistance, 33,34 elasticity, 30,31 wettability, 20,31,32,35 biocompatibility, 35,36 as well as protective, 23,37 optical, 20,23 barrier, [38][39][40] diffusion, 41 and sorption properties.…”