2011
DOI: 10.7567/jjap.50.03cb07
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Employ Present Five Masks Amorphous Silicon Thin-Film Transistor Design and Process Flow to Realize 5-in. InGaZnO Active-Matrix Liquid Crystal Display with Improved Stress Stability

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Cited by 4 publications
(2 citation statements)
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“…It is shown that devices with N O treatment have better electrical stability than devices with O treatment during the DC stress. The stress result is quite consist with previous report that devices with N O treatment have better electrical stability [24]- [26] owing to the effect of repairing of device back channel defect [27], [28].…”
Section: Device Fabricationsupporting
confidence: 78%
“…It is shown that devices with N O treatment have better electrical stability than devices with O treatment during the DC stress. The stress result is quite consist with previous report that devices with N O treatment have better electrical stability [24]- [26] owing to the effect of repairing of device back channel defect [27], [28].…”
Section: Device Fabricationsupporting
confidence: 78%
“…Transparent oxide-based thin-film transistors (TFTs), such as amorphous InGaZnO (α-IGZO) TFTs, have shown considerable potential for applications in flat, flexible, and transparent display devices, benefiting from their advantageous properties like high mobility, excellent uniformity, low processing temperature, and high optical transparency. [1][2][3][4][5] As a result, they have been practically used as pixel switches and current drivers in active-matrix liquid crystal displays (AMLCDs) and active-matrix organic light-emitting diodes (AMOLEDs). [6,7] However, reliability remains a critical issue in α-IGZO TFTs, especially for applications under bias stress, light illumination, or other extreme working conditions.…”
Section: Introductionmentioning
confidence: 99%