Enabling the lithography roadmap: an immersion tool based on a novel stage positioning system

Jong, F. de; Pasch, Bert van der; Castenmiller, Tom; Vleeming, Bert; Droste, Richard; Mast, Frank van de

doi:10.1117/12.814254

Cited by 20 publications

(17 citation statements)

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“…An encoder head is place on the corner of each chuck. A grating plane consisting of a 2‐dimensional grating is used as the reference for the encoder measurement, as shown in Figure 21 47 . Due to the thermal expansion effect of the chuck, the measurement direction is selected tangent to the center of the chuck, which improves the thermal stability of the position measurement.…”

Section: Stage Position Measurementmentioning

confidence: 99%

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Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Song

Chen

Huo³

et al. 2021

Int Journal of Mech Sys Dyn

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As one of the most advanced and precise equipment in the world, a photolithography scanner is able to fabricate nanometer-scale devices on a chip. To realize such a small dimension, the optical system is the fundamental, but the mechanical system often becomes the bottleneck. In the photolithography, the exposure is a dynamic process. The accuracy and precision of the movement are determined by the mechanical system, which is even more difficult to control compared with the optical system. In the mechanical system, there are four crucial components: the reticle and wafer stages, the linear motor, the metrology system, and the control system. They work together to secure the reticle and substrate locating at the correct position, which determines the overlay and alignment performance in the lithography. In this paper, the principles of these components are reviewed, and the development history of the mechanical system is introduced.

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Section: Stage Position Measurementmentioning

confidence: 99%

Section: Stage Position Measurementmentioning

confidence: 99%

Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Song

Chen

Huo³

et al. 2021

Int Journal of Mech Sys Dyn

View full text Add to dashboard Cite

show abstract

“…In lithography machines for semiconductor fabrication, the laser interferometer and grating interferometer have been extensively applied due to their nanometer, even sub-nanometer, precision measurement ability [1,2,3]. Since the very beginning, the laser interferometers have served this industry and take the wavelength as measurement benchmark, which limits the measurement performance for their suffering from the noise of laser source frequency fluctuation, thermal drift and refractive index variation [4] even with a well controlled environment.…”

Section: Introductionmentioning

confidence: 99%

“…In the mainstream of 28 nm to 10 nm lithography equipment, the encoder head is fixed at each corner of the wafer stage, combined for the measurement of six-degree-of-freedom displacement relative to the grating (including a ±1 mm range in out-of-plane direction and ±1.5 mrad angular range in rotation) as Figure 1 shows. For ultra-precision measurement of the wafer stage, in-plane and out-of-plane displacement measurement ability in the motion range and sub-nanometer stability over the exposure time of a single wafer (given a throughput of more than 200 wafers per hour, this time is typically less than about half minutes) are demanded of a single interferometric encoder [2,3].…”

Section: Introductionmentioning

confidence: 99%

Two Degree-of-Freedom Fiber-Coupled Heterodyne Grating Interferometer with Milli-Radian Operating Range of Rotation

Yang

Zhang

Zhu

et al. 2019

Sensors

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In the displacement measurement of the wafer stage in lithography machines, signal quality is affected by the relative angular position between the encoder head and the grating. In this study, a two-degree-of-freedom fiber-coupled heterodyne grating interferometer with large operating range of rotation is presented. Fibers without fiber couplers are utilized to receive the interference beams for high-contrast signals under the circumstances of large angular displacement and ZEMAX ray tracing software simulation and experimental validation have been carried out. Meanwhile, a reference beam generated inside the encoder head is adopted to suppress the thermal drift of the interferometer. Experimental results prove that the proposed grating interferometer could realize sub-nanometer displacement measurement stability in both in-plane and out-of-plane directions, which is 0.246 nm and 0.465 nm of 3σ value respectively within 30 s.

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“…Owing to its better environmental stability, an interferometric displacement measurement technique based on diffraction grating is an alternative to a laser interferometer for identifying the position of a wafer stage in a photolithography scanner [1,2,3]. For ultraprecision positioning of the wafer stage in a nonvacuum environment, the sensor and the displacements calculation algorithm are critical to the performance of the measurement system [4].…”

Section: Introductionmentioning

confidence: 99%

Ultraprecision Real-Time Displacements Calculation Algorithm for the Grating Interferometer System

Zhang

Zhu

et al. 2019

Sensors

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Grating interferometry is an environmentally stable displacement measurement technique that has significant potential for identifying the position of the wafer stage. A fast and precise algorithm is required for real-time calculation of six degrees-of-freedom (DOF) displacement using phase shifts of interference signals. Based on affine transformation, we analyze diffraction spot displacement and changes in the internal and external effective optical paths of the grating interferometer caused by the displacement of the wafer stage (DOWS); then, we establish a phase shift-DOWS model. To solve the DOWS in real time, we present a polynomial approximation algorithm that uses the frequency domain characteristics of nonlinearities to achieve model reduction. The presented algorithm is verified by experiment and ZEMAX simulation.

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Enabling the lithography roadmap: an immersion tool based on a novel stage positioning system

Cited by 20 publications

References 0 publications

Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Mechanical system and dynamic control in photolithography for nanoscale fabrication: A critical review

Two Degree-of-Freedom Fiber-Coupled Heterodyne Grating Interferometer with Milli-Radian Operating Range of Rotation

Ultraprecision Real-Time Displacements Calculation Algorithm for the Grating Interferometer System

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