2011
DOI: 10.1021/es1030273
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Enhanced Dechlorination of Tetrachloroethylene by Zerovalent Silicon in the Presence of Polyethylene Glycol under Anoxic Conditions

Abstract: The combination of zerovalent silicon (Si(0)) with polyethylene glycol (PEG) is a novel technique to enhance the dechlorination efficiency and rate of chlorinated hydrocarbons. In this study, the dechlorination of tetrachloroethylene (PCE) by Si(0) in the presence of various concentrations of PEG was investigated under anoxic conditions. Several surfactants including cetyltrimethylammonium bromide (CTAB), sodium dodecyl sulfate (SDS), and Tween 80 were also selected for comparison. Addition of SDS and Tween 80… Show more

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Cited by 12 publications
(4 citation statements)
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“…Interestingly, results displayed in Figure 10 show that the k obs for PCE dechlorination is 1.5 times higher than that of CTAB and more than 100 times higher than that by Si alone, clearly indicating that the addition of PEG can effectively enhance the dechlorination efficiency and rate of chlorinated hydrocarbons. (38).…”
Section: The Enhancement Methods By the Addition Of Surfactantsmentioning
confidence: 99%
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“…Interestingly, results displayed in Figure 10 show that the k obs for PCE dechlorination is 1.5 times higher than that of CTAB and more than 100 times higher than that by Si alone, clearly indicating that the addition of PEG can effectively enhance the dechlorination efficiency and rate of chlorinated hydrocarbons. (38).…”
Section: The Enhancement Methods By the Addition Of Surfactantsmentioning
confidence: 99%
“…Liu et al (43) proposed an idea to preserve the reductive ability by terminating the formation of H 2 in zerovalent iron system, which could increase the dechlorination rate of chlorinated hydrocarbons and keep the benefit for long-term usage. Interestingly, addition of PEG also can prevent the formation of SiO 2 onto the surface of zerovalent iron, leading to the acceleration of dechlorination efficiency and rate of PCE (38). To further examine the effect of PEG on the formation of silicon dioxide, various loadings of PEG ranging between 0.01 and 0.6 μM were added into Si-H 2 O system.…”
Section: The Enhancement Methods By the Addition Of Surfactantsmentioning
confidence: 99%
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