2023
DOI: 10.1021/acsaelm.3c00756
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Enhanced Endurance and Imprint Properties in Hf0.5Zr0.5O2−δ Ferroelectric Capacitors by Tailoring the Oxygen Vacancy

Abstract: HfO 2 -based ferroelectric thin films are promising in both memory and logic devices owing to their compatibility with complementary metal-oxide-semiconductor platforms and excellent thickness scalability. However, the fatigue and imprint effect are the main concerns, hindering the device's applications. In this work, we comprehensively investigate the impact of oxygen vacancies on the reliability of Hf 0.5 Zr 0.5 O 2−δ (HZO) ferroelectric capacitors. The oxygen vacancy concentration was tailored by varying th… Show more

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Cited by 11 publications
(1 citation statement)
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“…6(a), with the number of cycles increases, HZO FE capacitors exhibit three states: 1) Waking-up state-the polarization of HZO devices increases with cycling operation due to the redistribution of oxygen vacancies or the transformation of tetragonal phases into orthogonal phases [13,14] ; 2) Wakedup state-The polarization of FE devices remains relatively sta-ble as the number of cycles increases; 3) Fatigue state-Stress gradually accumulates, generating oxygen vacancies at grain boundaries, leading to a decrease in polarization and an increase in leakage [15,16] . Typically, imprint measurements were conducted by using waked-up FE devices [17,18] . However, the measurement of imprint for HZO capacitors during the waking-up and fatigue states has not been evaluated yet.…”
Section: Relationship Between Imprint and Retentionmentioning
confidence: 99%
“…6(a), with the number of cycles increases, HZO FE capacitors exhibit three states: 1) Waking-up state-the polarization of HZO devices increases with cycling operation due to the redistribution of oxygen vacancies or the transformation of tetragonal phases into orthogonal phases [13,14] ; 2) Wakedup state-The polarization of FE devices remains relatively sta-ble as the number of cycles increases; 3) Fatigue state-Stress gradually accumulates, generating oxygen vacancies at grain boundaries, leading to a decrease in polarization and an increase in leakage [15,16] . Typically, imprint measurements were conducted by using waked-up FE devices [17,18] . However, the measurement of imprint for HZO capacitors during the waking-up and fatigue states has not been evaluated yet.…”
Section: Relationship Between Imprint and Retentionmentioning
confidence: 99%