2023
DOI: 10.1088/1361-6528/acb6df
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Enhanced etching resolution of self-assembled PS-b-PMMA block copolymer films by ionic liquid additives

Abstract: Polystyrene-block-poly(methyl methacrylate) (PS-b-PMMA) is one of the most widely studied block copolymers for direct self-assembly because of its excellent compatibility with traditional processes. However, pattern transfer of PS-b-PMMA block copolymers (BCPs) remains a great challenge for its applications due to the insufficient etching resolution. In this study, the effect of ionic liquid (IL) 1-hexyl-3- methylimidazolium hexafluorophosphate (HMHF) additives on the line edge roughness (LER) performances of … Show more

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