2009
DOI: 10.1016/j.apsusc.2008.11.063
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Enhanced field emission from Si doped nanocrystalline AlN thin films

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Cited by 18 publications
(2 citation statements)
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“…We think that this may be due to the low precision of our X-ray diffraction and the low thickness of our AlN top layer. In general, only the AlN films with a thickness of a several hundred nanometers can show obvious AlN peaks [ 20 , 21 , 22 ]. However, the thickness of the AlN film in our work is only about 30 nm.…”
Section: Resultsmentioning
confidence: 99%
“…We think that this may be due to the low precision of our X-ray diffraction and the low thickness of our AlN top layer. In general, only the AlN films with a thickness of a several hundred nanometers can show obvious AlN peaks [ 20 , 21 , 22 ]. However, the thickness of the AlN film in our work is only about 30 nm.…”
Section: Resultsmentioning
confidence: 99%
“…27,28 Therefore, it can be speculated that the FE behaviors of these two types of doped AlN nanostructures would be different. Though both Si-doped AlN nanoneedle arrays and thin lms showed excellent FE performances, [37][38][39][40] the effects of different doping types on the FE properties of the doped AlN nanostructures has yet to be comparatively studied, which would help clarify the performance modulation of eld emitters. In this study, we synthesized patterned arrays of Si-or Mg-doped AlN nanocones by in situ doping through a Mo grid-masked chemical vapor deposition (CVD) method and examined their FE properties.…”
mentioning
confidence: 99%