2012
DOI: 10.1016/j.jcrysgro.2012.04.042
|View full text |Cite
|
Sign up to set email alerts
|

Enhanced growth rate for ammonothermal gallium nitride crystal growth using ammonium iodide mineralizer

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
4

Citation Types

1
34
0

Year Published

2013
2013
2024
2024

Publication Types

Select...
10

Relationship

0
10

Authors

Journals

citations
Cited by 36 publications
(35 citation statements)
references
References 25 publications
1
34
0
Order By: Relevance
“…[9][10][11][12][13][14] The ammonothermal method has produced very high quality, low TDD (<10 4 cm À2 ) GaN wafers; however, poor growth rates (<4 lm/h) and purity issues limited the commercial availability of ammonothermal substrates. Imanishi et al have demonstrated GaN crystals with TDD $10 3 cm À2 via Na-flux growth; 15 however, challenges with the Na-flux method are primarily the feasibility for upscaling and cost.…”
Section: Introductionmentioning
confidence: 99%
“…[9][10][11][12][13][14] The ammonothermal method has produced very high quality, low TDD (<10 4 cm À2 ) GaN wafers; however, poor growth rates (<4 lm/h) and purity issues limited the commercial availability of ammonothermal substrates. Imanishi et al have demonstrated GaN crystals with TDD $10 3 cm À2 via Na-flux growth; 15 however, challenges with the Na-flux method are primarily the feasibility for upscaling and cost.…”
Section: Introductionmentioning
confidence: 99%
“…1 The ammonothermal growth is considered an efficient and scalable bulk GaN growth method, and high quality ammonothermal crystals have been achieved by several groups. [2][3][4][5] To sustain the continuous improvement of bulk GaN crystal quality, it is imperative to characterize the defect structure. However, due to the low defect density (as low as 5 Â 10 3 cm À2 ) in state of the art crystals, 6 defect characterization with conventional methods suitable for higher dislocation density materials is becoming increasingly difficult.…”
Section: Introductionmentioning
confidence: 99%
“…Great effort is being put into maintaining steady improvement in crystal quality of bulk GaN substrates. Ammonothermal growth of GaN is an efficient and scalable method capable of producing high quality and low dislocation density GaN crystals [1][2][3][4]. Structural characterization is critical to further improve the material quality, but characterization of defects by conventional methods is becoming increasingly difficult due to the low defect density.…”
Section: Introductionmentioning
confidence: 99%