“…Numbers techniques have been developed to fabricate BFO thin film in past years, such as pulsed laser deposition (PLD), [ 2,29,36 ] radio‐frequency (RF) magnetron sputtering, [ 4,37,38 ] molecular beam epitaxy (MBE), [ 39,40 ] and metalorganic chemical vapor deposition (MOCVD), [ 41,42 ] as well as sol–gel/chemical‐solution deposition (CSD). [ 3,43,44 ] As shown in Table 1 , [ 2,4,24,29,30,36,38,41,43–61 ] which lists the reported BFO films with their observed polarization ( P )–electric field ( E ) loops, it has been demonstrated that the physical‐based processing, such as PLD or RF, can deposit relatively dense BFO thin films, that show lower leakage and defects. As a result, these BFO thin films show a thinner film thickness and lower coercive field.…”