“…The main factors that limit the LEE include the optical polarization of Al-rich AlGaN multiple quantum wells (MQWs), the total internal reflection at the interface between two layers with different refractive indexs, and the strong absorption of DUV light by p-GaN layer, which is essential for hole supply and the formation of Ohmic contact [7], [8], [9], [10], [11]. Many research groups have made efforts to overcome these difficulties and put forward various approaches: introducing a large-area AlN nanophotonic light extraction structure or moth-eye microstructure to enlarge the light escape cone thus weakening the limitation of the total reflection [12], [13], increasing the in-plane compressive strain of the quantum wells to obtain a higher polarization degree or taking micro-LED or arrays to help in-plane TM photons to escape [14], [15], [16], [17], [18], and adopting inclined sidewalls covered by a MgF2/Al omni-directional mirror, distributed Bragg reflectors, Cr/Al n-type electrode or reflective photonic crystals to improve the reflection [19], [20], [21], [22]. In addition, many methods have been adopted to reduce the absorption of p-GaN and Ni/Au electrodes for improving the LEE, such as tunnel-injected LED, laterally over-etched p-GaN layer, micro-ring array DUV-LED and so on [23], [24], [25].…”