2015
DOI: 10.1063/1.4922699
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Enhanced light extraction of scintillator using large-area photonic crystal structures fabricated by soft-X-ray interference lithography

Abstract: Soft-X-ray interference lithography is utilized in combination with atomic layer deposition to prepare photonic crystal structures on the surface of Bi4Ge3O12 (BGO) scintillator in order to extract the light otherwise trapped in the internal of scintillator due to total internal reflection. An enhancement with wavelength- and emergence angle-integration by 95.1% has been achieved. This method is advantageous to fabricate photonic crystal structures with large-area and high-index-contrast which enable a high-ef… Show more

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Cited by 49 publications
(19 citation statements)
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“…TiO 2 layer is then deposited using Atomic Layer Deposition (ALD). The high refractive index of the conformal TiO 2 layer enables light extraction enhancement of up to 95.1% [161]. This technique is mass scalable however the patterns are limited to those which can be produced from wave interference.…”
Section: Nanostructuring Of Bulk Scintillatorsmentioning
confidence: 99%
“…TiO 2 layer is then deposited using Atomic Layer Deposition (ALD). The high refractive index of the conformal TiO 2 layer enables light extraction enhancement of up to 95.1% [161]. This technique is mass scalable however the patterns are limited to those which can be produced from wave interference.…”
Section: Nanostructuring Of Bulk Scintillatorsmentioning
confidence: 99%
“…Another technique tested in 2014 [75] uses interference lithography of a soft X-ray coherent beam. The crystals used for this test were two BGO (BiGeO, RI = 2.15), in a slab geometry of 1 × 10 × 20 mm 3 and unwrapped configuration.…”
Section: Interference Lithography Applied To Bgomentioning
confidence: 99%
“…Enhanced light extraction of scintillator [29]: Scintillators are usually used in the radiation detection system. Luminescence in ultraviolet or visible emission can be excited on scintillators by radiation from X-ray, c-ray, electrons, protons and neutrons.…”
Section: Nano-sciencementioning
confidence: 99%
“…This work was supported by National Key R&D Program of China (2016YFA0401302),the [15,16], SXIL [23] and stitching multi-grating EUV-IL/SXIL [17,18] and parts of the nanoscience applications of EUV-IL are taken from [27][28][29][30][31].…”
Section: Acknowledgementsmentioning
confidence: 99%