Enhanced mechanical properties of HfO₂ film by nitrogen doping

Abstract

The chemical composition, structure and mechanical properties of hafnium oxide films with different nitrogen constituents were investigated. X-ray photoelectron spectrum analysis showed that nitrogen atoms acted as oxygen substitution and interstitial atoms. The crystalline features exhibited no change during nitrogen doping. Nevertheless, the films with high compressive stress displayed significantly enhanced mechanical properties. The enhanced mechanism could mainly be attributed to the dislocation obstacle motion by inserting nitrogen atoms.

Experimental Investigation on the Sputtering Process for Tantalum Oxynitride Thin Films

“…This feature provides an advantage for applications that require continuous operations under oxidative environments or submersion in aqueous solutions, such as water splitting or environmental treatment [1]. Metal oxynitrides are also mechanically stronger than pure oxides because of denser structures packed by nitrides [4][5][6].…”