Enhanced oxidation of TiAlN barriers integrated in three-dimensional ferroelectric capacitor structures

Ultrathin amorphous Ni–Ti film is investigated as conductive diffusion barrier layer to integrate La0.5Sr0.5CoO3∕PbZr0.4Ti0.6O3∕La0.5Sr0.5CoO3 (LSCO/PZT/LSCO) capacitors on silicon. X-ray photoelectron spectroscopy results demonstrate that Ni in LSCO∕Ni–Ti∕Si heterostructure is not oxidized after 550°C annealing in oxygen. The structural properties of LSCO∕PZT∕LSCO∕Ni–Ti∕Si are characterized by x-ray diffraction and transmission electron microscopy. It is found that Ni–Ti film is still amorphous and that there are no discernible reactions at the interfaces of the sample. LSCO/PZT/LSCO capacitor, measured at 5V, possesses very good ferroelectric properties, such as low coercive field (∼1.28V), high remnant polarization (∼27.9μC∕cm2), and good fatigue-free characteristic, implying that ultrathin amorphous Ni–Ti film can be used as barrier layer for fabricating high-density ferroelectric random access memories.

show abstract

Structural and nano-mechanical characterization of TiN / Ti<inf>1−x</inf>Al<inf>x</inf>N multilayered thin films

Jose

Ramaseshan

Parida

et al. 2011

International Conference on Nanoscience, Engineering and Technology (ICONSET 2011)

View full text Add to dashboard Cite

Enhanced oxidation of TiAlN barriers integrated in three-dimensional ferroelectric capacitor structures

Cited by 3 publications

References 16 publications

Ion beam sputter deposited TiAlN films for metal–insulator–metal (Ba,Sr)TiO3 capacitor application

Ion beam sputter deposited TiAlN films for metal–insulator–metal (Ba,Sr)TiO3 capacitor application

Barrier performance of ultrathin Ni–Ti film for integrating ferroelectric capacitors on Si

Structural and nano-mechanical characterization of TiN / Ti<inf>1−x</inf>Al<inf>x</inf>N multilayered thin films

Contact Info

Product

Resources

About

Enhanced oxidation of TiAlN barriers integrated in three-dimensional ferroelectric capacitor structures

Cited by 3 publications

References 16 publications

Ion beam sputter deposited TiAlN films for metal–insulator–metal (Ba,Sr)TiO3 capacitor application

Ion beam sputter deposited TiAlN films for metal–insulator–metal (Ba,Sr)TiO3 capacitor application

Barrier performance of ultrathin Ni–Ti film for integrating ferroelectric capacitors on Si

Structural and nano-mechanical characterization of TiN / Ti<inf>1&#x2212;x</inf>Al<inf>x</inf>N multilayered thin films

Contact Info

Product

Resources

About

Structural and nano-mechanical characterization of TiN / Ti<inf>1−x</inf>Al<inf>x</inf>N multilayered thin films