2017
DOI: 10.1109/led.2017.2687941
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Enhanced Performance of Thiophene-Rich Heteroacene, Dibenzothiopheno [6,5-b:6’,5’-f] Thieno[3,2-b]Thiophene Thin-Film Transistor With MoOxHole Injection Layers

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Cited by 6 publications
(3 citation statements)
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“…It is also observable from Table‐2, that the drift mobility of holes (μ=eτi/m*) which exhibits value of 5.56 and 6.64 cm 2 V −1 s −1 for MoO 3 and CuSe, respectively, increases to 7.76 cm 2 V −1 s −1 upon the two materials interfacing. The value of the drift mobility is consistent with the value reported as 7.0 cm 2 V −1 s −1 for the highly performing thin‐film transistors made of thermally evaporated amorphous MoO x . These transistors are reported to exhibit linear and saturation regimes as well as an ON/OFF current ratio of 10 7 .…”
Section: Resultssupporting
confidence: 86%
“…It is also observable from Table‐2, that the drift mobility of holes (μ=eτi/m*) which exhibits value of 5.56 and 6.64 cm 2 V −1 s −1 for MoO 3 and CuSe, respectively, increases to 7.76 cm 2 V −1 s −1 upon the two materials interfacing. The value of the drift mobility is consistent with the value reported as 7.0 cm 2 V −1 s −1 for the highly performing thin‐film transistors made of thermally evaporated amorphous MoO x . These transistors are reported to exhibit linear and saturation regimes as well as an ON/OFF current ratio of 10 7 .…”
Section: Resultssupporting
confidence: 86%
“…In order to understand the improvement in contact resistance of these devices, the electronic structures of C 8 -BTBT and various interfaces were investigated. The MoO 3 and WO 3 are well known transition metal oxides and widely used as interlayer between the metal electrode and organic layer in organic photovoltaic devices 22,23 . Electron affinity (EA), ionization energy (IE) and work function of transition metal oxides can be precisely measured using photoemission spectroscopy and thus very deep lying energy levels of these oxides were confirmed 24,25 .…”
Section: Resultsmentioning
confidence: 99%
“…The IDS-VDS curves are probed at gate voltages of −30, −20, −10, 0, 10, 20, and 30 V. In the low VDS region of the curves, IDS changes non-linearly with VDS. This resulted from the relatively high work function of Au, compared with that of SnO2, and the consequent Schottky contact between the SnO2 channel and the Au source/drain electrodes [18][19][20]. The negative output differential resistance effect observed in Figure 3b was induced by the large gate leakage current.…”
Section: Resultsmentioning
confidence: 98%