Novel, low‐voltage, high‐detectivity, solution‐processed, flexible near‐infrared (NIR) photodetectors for optoelectronic applications are realized and their optoelectronic properties are investigated for the first time. This is achieved by synthesizing Ag2Se nanoparticles (NPs) in aqueous solutions, and depositing highly crystalline Ag2Se thin films at 150 °C with redistributed Ag2Se NPs in aqueous inks. The high conductivity and low trap concentration of the 150 °C annealed Ag2Se films result from the Ag formed inside the films and the improved film quality, respectively. These factors are both critical for the realization of high‐performance flexible photodetectors. The fabricated device exhibits a high detectivity of 7.14 × 109 Jones (above 1 × 109) at room temperature, delivering low power consumption. This detectivity is superior to those of reported low band‐gap semiconductor systems, although the device has undergone 0.38% compressive and tensile strains. Moreover, the performance of the device is better than that of MoS2‐based phototransistors, black arsenic phosphorus field‐effect transistors, or commercial thermistor bolometers at room temperature (D* ≈ 108 Jones), and is exposed to mid‐infrared light.

We investigate the annealing environment effect on ZrO2-based resistive random-access memory (RRAM) devices. Fabricated devices exhibited conventional bipolar-switching memory properties. In particular, the vacuum-annealed ZrO2 films exhibited larger crystallinity and grain size, denser film, and a relatively small quantity of oxygen vacancies compared with the films annealed in air and N2. These led to a decrease in the leakage current and an increase in the resistance ratio of the high-resistance state (HRS)/low-resistance state (LRS) and successfully improved non-volatile memory properties, such as endurance and retention characteristics. The HRS and LRS values were found to last for 104 s without any significant degradation.

Sol–gel-processed Ti-doped SnO2 thin-film transistors (TFTs) were successfully fabricated for the first time, and the effects of the concentration of the Ti dopant on their structural, chemical, and optical properties were investigated. The introduced Ti dopant showed potential as a promising oxygen vacancy suppressor. Additionally, the results showed that the 0.1 wt% Ti-doped SnO2 TFT had a field-effect mobility of 10.21 cm2 V−1 s−1, a subthreshold swing of 0.87, and an I on/I off value of ∼1 × 108, as well as good negative bias stress characteristics. The success of the Ti doping could be attributed to its small ionic size, high Lewis acid strength, and strong bonding strength. Therefore, the introduced sol–gel-processed Ti-doped SnO2 TFTs stand as promising candidates with potential for application in transparent displays as well as larger area electronics applications.

The effect of annealing ambient on SnO 2 thin-film transistors (TFTs) fabricated via an ethanol-based sol-gel route was investigated. The annealing ambient has a significant effect on the structural characteristics and chemical composition and, in turn, the device performance. Although the crystalline-grain size of the SnO 2 films annealed in air was the smallest, this size yielded the highest field-effect mobility. Compared with the minimization of boundary scattering via crystalline-size increase, augmentation of the free carrier concentration played a more critical role in the realization of high-performance devices. The fabricated SnO 2 TFTs delivered a field-effect mobility, subthreshold swing, and on/off current ratio of 10.87 cm 2 /Vs, 0.87 V/decade, and 10 7 , respectively.

Sol-gel-processed Mg-doped SnO2 thin-film transistors (TFTs) were successfully fabricated. The effect of Mg concentration on the structural, chemical, and optical properties of thin films and the corresponding TFT devices was investigated. The results indicated that an optimal Mg concentration yielded an improved negative bias stability and increased optical band gap, resulting in transparent devices. Furthermore, the optimal device performance was obtained with 0.5 wt% Mg. The fabricated 0.5 wt% Mg-doped SnO2 TFT was characterized by a field effect mobility, a subthreshold swing, and Ion/Ioff ratio of 4.23 cm2/Vs, 1.37 V/decade, and ~1 × 107, respectively. The added Mg suppressed oxygen-vacancy formation, thereby improving the bias stability. This work may pave the way for the development of alkaline-earth-metal-doped SnO2-based thin-film devices.