A memristor is the memory extension to the concept of resistor. With unique superior properties, memristors have prospective promising applications in non-volatile memory (NVM). Resistive random access memory (RRAM) is a non-volatile memory using a material whose resistance changes under electrical stimulus can be seen as the most promising candidate for next generation memory both as embedded memory and a stand-alone memory due to its high speed, long retention time, low power consumption, scalability and simple structure. Among carbon-based materials, graphene has emerged as wonder material with remarkable properties. In contrast to metallic nature of graphene, the graphene oxide (GO) is good insulating/semiconducting material and suitable for RRAM devices. The advantage of being atomically thin and the two-dimensional of GO permits scaling beyond the current limits of semiconductor technology, which is a key aspect for high-density fabrication. Graphene oxide-based resistive memory devices have several advantages over other oxide materials, such as easy synthesis and cost-effective device fabrication, scaling down to few nanometre and compatibility for flexible device applications. In this chapter, we discuss the GO-based RRAM devices, which have shown the properties of forming free, thermally stable, multi-bit storage, flexible and high on/ off ratio at low voltage, which boost up the research and development to accelerate the GO-based RRAM devices for future memory applications.