2007
DOI: 10.1116/1.2800325
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Enhanced stitching for the fabrication of photonic structures by electron beam lithography

Abstract: Electron-beam lithography for photonic waveguide fabrication: Measurement of the effect of field stitching errors on optical performance and evaluation of a new compensation method

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Cited by 18 publications
(6 citation statements)
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“…In order to obtain a wide range of device functionality, the reduction of propagation losses in narrow wires is equally important, although there are still performance limitations determined by fabrication processes [9]. Recently losses as low as 0.92 dB/cm for a very narrow wire have been reported [10] through the use of hydrogen silsesquioxane (HSQ) resist and a reduction, through stage-tilt compensation techniques, of stitching errors produced during the electron-beam lithographic patterning process [11]. Compact single-row PhC structures embedded in PhW waveguide micro-cavities are essential components for wavelength selective devices, especially for possible application in WDM systems.…”
Section: Introductionmentioning
confidence: 99%
“…In order to obtain a wide range of device functionality, the reduction of propagation losses in narrow wires is equally important, although there are still performance limitations determined by fabrication processes [9]. Recently losses as low as 0.92 dB/cm for a very narrow wire have been reported [10] through the use of hydrogen silsesquioxane (HSQ) resist and a reduction, through stage-tilt compensation techniques, of stitching errors produced during the electron-beam lithographic patterning process [11]. Compact single-row PhC structures embedded in PhW waveguide micro-cavities are essential components for wavelength selective devices, especially for possible application in WDM systems.…”
Section: Introductionmentioning
confidence: 99%
“…The EBL provides a low-cost, fast turn-around, foundry-compatible fabrication alternative that has been optimized [16][17][18] to produce consistent, robust, low-loss silicon photonic components 19 , making the transition to a costly foundry service with high confidence. Several test structures have been fabricated, for TE and TM polarization and for the case of identical pair of waveguides and not identical pair.…”
Section: Methodsmentioning
confidence: 99%
“…2(b)) were realized on 220 nm SOI material from Soitech (Peabody, MA) and fabricated in the University of Washington's Microfabrication Facility (MFF) using a JEOL JBX-6300FS Direct Write E-Beam Lithography System (EBL) (Peabody, MA). The EBL provides a low-cost, fast turn-around, foundry-compatible fabrication alternative that has been optimized [28][29][30] to produce consistent, robust, low-loss silicon photonic components [31], making the transition to a costly foundry service with high confidence. Our test setup, shown in Fig.…”
Section: Methodsmentioning
confidence: 99%