In the present work, tetrahedrite Cu12Sb4S13 thin films were deposited on various substrates
via
aerosol-assisted chemical vapor deposition (AACVD) using diethyldithiocarbamate
complexes as precursors. A buffer layer of Sb2O3 with a small lattice mismatch to Cu12Sb4S13 was applied to one of the glass substrates to improve the
quality of the deposited thin film. The buffer layer increased the
coverage of the Cu12Sb4S13 thin film,
resulting in improved electrical transport properties. The growth
of the Cu12Sb4S13 thin films on the
other substrates, including ITO-coated glass, a SiO2-coated
Si wafer, and mica, was also investigated. Compared to the films grown
on the other substrates, the Cu12Sb4S13 thin film deposited on the SiO2-coated Si wafer showed
a dense and compact microstructure and a larger grain size (qualities
that are beneficial for carrier transport), yielding a champion power
factor (PF) of ∼362 μW cm–1 K–2 at 625 K. The choice of substrate strongly influenced the composition,
microstructure, and electrical transport properties of the deposited
Cu12Sb4S13 thin film. At 460 K, the
highest zT value that was obtained for the thin films
was ∼0.18. This is comparable to values reported for Cu–Sb–S
bulk materials at the same temperature. Cu12Sb4S13 thin films deposited using AACVD are promising for
thermoelectric applications. To the best of our knowledge, the first
full thermoelectric characterization of the Cu12Sb4S13 thin film is performed in this work.