“…The reasons for the decrease in dielectric nonlinearity, deterioration of losses, and increase in leakage current of thin films may be a dead layer on the film-substrate interface [18], internal stresses in epitaxial films [19], and poor electrical conductivity of oxide-conducting electrodes [20]. To improve the electrical characteristics of FE films, high-temperature annealing of deposited films [21,22], strain engineering [23,24], and structuring of FE layers are used [25,26]. However, despite the fact that epitaxial FE films are confidently formed on structurally matched monocrystalline substrates such as MgO, SrTiO 3 , and LaAlO 3 , the best microwave characteristics, which have not been improved to date, have been demonstrated on polycrystalline films deposited by the magnetron sputtering technique [27,28].…”