Enhancement in Tc of superconducting BPSCCO thick films due to irradiation of energetic argon ions of dense plasma focus

Agarwala, Priti; Srivastava, M. P.; Dheer, P.N.; Padmanaban, Vishnu; Gupta, Anurag

doi:10.1016/s0921-4534(98)00682-0

Cited by 24 publications

(18 citation statements)

References 18 publications

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“…In the case of an intermediate superconducting state for a circular conductor of radius r 0 , we have (1) where R is the impedance of the conductor containing the interior cylindrical region of radius r 1 in the inter mediate superconducting layer, R n is the impedance of the normal metal in the tube with r 1 < r < r 0 , J is the current density, and J c is the critical current density. (1), there is a jump from 0 to R n /2, whose value gradually approaches R n as the current density increases, J > J c .…”

Section: Methodsmentioning

confidence: 99%

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Change in critical parameters of Bi-2223 high temperature superconductors under action of shock waves

Kolokoltsev

Михайлов

Ivanov

et al. 2012

Inorg. Mater. Appl. Res.

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Section: Methodsmentioning

confidence: 99%

“…For the first time, information on an increase in the critical temperature by 15 K caused by plasma shock of films consisting of the mixture of the 2212 and 2223 phases was published in [1]. Later, the possibility of increasing the critical current in a magnetic field owing to plasma generated shock waves (SWs) was shown in [2,3].…”

Section: Introductionmentioning

confidence: 99%

Change in critical parameters of Bi-2223 high temperature superconductors under action of shock waves

Kolokoltsev

Михайлов

Ivanov

et al. 2012

Inorg. Mater. Appl. Res.

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“…This device is low cost and is able to deposit wide range of materials on different substrates at room temperature. It has been used in earlier research works for introducing phase change in materials [13][14][15][16][17] and for preparation of thin films [18][19][20][21]. More recently, the DPF device is used for deposition of nanoparticles of different materials [3][4].…”

Section: Introductionmentioning

confidence: 99%

Deposition of aluminium nanoparticles using dense plasma focus device

Devi¹,

Roy²,

Srivastava³

2010

J. Phys.: Conf. Ser.

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Abstract. Plasma route to nanofabrication has drawn much attention recently. The dense plasma focus (DPF) device is used for depositing aluminium nanoparticles on n-type Si (111) wafer. The plasma chamber is filled with argon gas and evacuated at a pressure of 80 Pa. The substrate is placed at distances 4.0 cm, 5.0 cm and 6.0 cm from the top of the central anode. The aluminium is deposited on Si wafer at room temperature with two focused DPF shots. The deposits on the substrate are examined for their morphological properties using atomic force microscopy (AFM). The AFM images have shown the formation of aluminium nanoparticles. From the AFM images, it is found that the size of aluminium nanoparticles increases with increase in distance between the top of anode and the substrate for same number of DPF shots. IntroductionAluminium is an important material for making contacts in silicon technology for its ability to make both ohmic and Schottky contacts [1]. It is possible to make ohmic contact by making the metal contacts to p-type regions and heavily doped n-type silicon regions and rectifying contact to lightly doped n-type silicon regions. The need for low temperature processing and low resistive material in IC technology has made this simple metal contacts widely used in large scale integration (LSI) and also in early stage of the very large scale integration (VLSI) in recent times. Nanostructures like aluminium silicon nanowire networks have also been fabricated on glass and Si substrates by dealloying an Al-Si thin film through selective chemical etching [2] in order to miniaturize and make power efficient devices. Nanowire can act as electron confinement structure. When it is coupled with appropriate self configuring computer control architecture it would enable realization of self assembled ultrahigh density electronic device. So, metallic contacts of atomic dimensions have been a subject of interest in recent times. Plasma aided nanofabrication [3][4][5][6] has been considered widely for material deposition. Many techniques such as ionized cluster beam (ICB), partially ionized beam (PIB) [7], electron beam evaporation [8], magnetron sputtering [9], pulsed microarc discharge [10] techniques have been employed to deposit aluminium on different substrates. ICB technique has a limitation that the requirement of using a small nozzle of the order of 1-2 mm for supersonic

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“…It was a general misconception that high density high temperature and strongly non equilibrium fusion plasmas are not suitable for material processing and deposition of nanoparticles and nanostructured materials. Recently, Srivastava and his research group had established in the series of the papers that high density high temperature plasma of DPF device similar to fusion plasma can be used for introducing phase changes [6][7][8][9][10], preparation of thin film [11][12][13][14][15][16] and nanoparticles [17][18]. It is found that this type of plasma is suitable for fabrication of nanoparticles and nanostructured materials.…”

Section: Introductionmentioning

confidence: 99%

Formation of iron nanoparticles on quartz substrate using dense plasma focus device

Singh¹,

Roy²,

Srivastava³

2010

J. Phys.: Conf. Ser.

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Author to whom any correspondence should be addressed. E-mail: mps02@rediffmail.comAbstract. Fabrication of nanoparticles and nanostructured materials is at the heart of modern nanoscience. In the present work, we are reporting the fabrication of Iron nanoparticles making use of high temperature, high density, and extremely non equilibrium pulsed plasma produced in 3.3 KJ Mather type Dense Plasma Focus (DPF) device. The Iron nanoparticles were deposited on quartz substrate at a distance of 5 cm above the ion source. The Iron nanoparticles are characterized structurally using X-ray diffractometer and topographically using Atomic force microscopy (AFM). The magnetic property was investigated using Magnetic Force Microscopy (MFM). It is found that these nanoparticles have a dimension in the range of 20-60 nm size and are magnetic in nature.

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Enhancement in Tc of superconducting BPSCCO thick films due to irradiation of energetic argon ions of dense plasma focus

Cited by 24 publications

References 18 publications

Change in critical parameters of Bi-2223 high temperature superconductors under action of shock waves

Change in critical parameters of Bi-2223 high temperature superconductors under action of shock waves

Deposition of aluminium nanoparticles using dense plasma focus device

Formation of iron nanoparticles on quartz substrate using dense plasma focus device

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