Silicon (Si) integration
is a critical step toward future applications
of multifunctional oxides as nanoscale electronics and spintronic
devices, because of the low cost and scalability of silicon substrates.
As a demonstration, self-assembled (La0.7Sr0.3MnO3)
x
: NiO1–x
(LSMO:NiO) vertically aligned nanocomposite (VAN)
thin films with exchange bias (EB) properties have been successfully
deposited on buffered Si substrates. To enable the epitaxial growth
of LSMO:NiO VAN, SrRuO3/TiN was first grown as the buffer
layers on Si substrates. The composition of the two-phases has been
varied with x = 0.25, 0.5, 0.75, and 1 to explore
the electrical transport and magnetic properties of the VAN system
on Si. The irreversible temperature T
irr was found to increase with increasing NiO composition, with the
highest for (LSMO)0.25(NiO)0.75 of ∼275
K, when the field was applied in the out-of-plane direction. In addition,
the EB effect has been observed for all the nanocomposite films, with
the highest H
EB value of 300 Oe for (LSMO)0.25(NiO)0.75. The integration of the VAN
system on Si with pronounced EB properties presents a promising approach
toward future practical devices using oxide VANs on Si.