2017
DOI: 10.1038/s41598-017-12114-y
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Enhancement of the Device Performance and the Stability with a Homojunction-structured Tungsten Indium Zinc Oxide Thin Film Transistor

Abstract: Tungsten-indium-zinc-oxide thin-film transistors (WIZO-TFTs) were fabricated using a radio frequency (RF) co-sputtering system with two types of source/drain (S/D)-electrode material of conducting WIZO (homojunction structure) and the indium-tin oxide (ITO) (heterojunction structure) on the same WIZO active-channel layer. The electrical properties of the WIZO layers used in the S/D electrode and the active-channel layer were adjusted through oxygen partial pressure during the deposition process. To explain enh… Show more

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Cited by 26 publications
(11 citation statements)
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“…These methods can lead to the higher output performance of TENGs, but are still limited in real applications due to the complexity, high-cost, and lack of both physical characteristic and analysis properties for understanding embedded NP behaviors inside the tribo-polymers layer. Moreover, oxygen vacancies in the oxide nanoparticles are electrically positive charges [ 9 ], which is an important factor that can contribute to the exchange and trapping of electrons when driving a TENG. In previous studies, however, the effect of oxygen vacancies within the tribo-material surface according to the oxide nanoparticle embedded ratio was not studied.…”
Section: Introductionmentioning
confidence: 99%
“…These methods can lead to the higher output performance of TENGs, but are still limited in real applications due to the complexity, high-cost, and lack of both physical characteristic and analysis properties for understanding embedded NP behaviors inside the tribo-polymers layer. Moreover, oxygen vacancies in the oxide nanoparticles are electrically positive charges [ 9 ], which is an important factor that can contribute to the exchange and trapping of electrons when driving a TENG. In previous studies, however, the effect of oxygen vacancies within the tribo-material surface according to the oxide nanoparticle embedded ratio was not studied.…”
Section: Introductionmentioning
confidence: 99%
“…The valence band energies of the metal oxides were obtained by UPS and the conduction band energies were obtained by adding the reported optical bandgap of each material to their valence band energies ( Figure S1, Supporting Information) [62]. According to a previously reported transistor, WIZO mobility and energy levels are 19.57 cm 2 /Vs and 3.4 Ev [44]. The Schottky barrier of ITO and PC 61 BM is 0.8 eV when metal oxides are not used.…”
Section: Resultsmentioning
confidence: 99%
“…Notably, the element W in WIZO thin films can be used to control the electronic structure, including the band alignment, oxygen-deficient bonding states, and band edge states below the conduction band. In addition, the W doping concentration in WIZO thin films may affect the electronic structure and can be used to control the device performance and stability characteristics [44]. Although W-based oxide films have yielded PCEs of up to 13%, they have received considerably less attention than other oxides such as Zn, Sn, In and Ni [28,41,44].…”
Section: Introductionmentioning
confidence: 99%
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“…Density and roughness of films fabricated were obtained by fitting the interference fringe of X-ray using EMPYREAN in Figure 2 [21]. No significant difference was found in the density of all samples (4.81-4.92g/cm 3 ).…”
Section: Methodsmentioning
confidence: 99%