2008
DOI: 10.1063/1.2830981
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Enhancement of the light output power of InGaN/GaN light-emitting diodes grown on pyramidal patterned sapphire substrates in the micro- and nanoscale

Abstract: Sapphire substrates were patterned by a chemical wet etching technique in the micro- and nanoscale to enhance the light output power of InGaN/GaN light-emitting diodes (LEDs). InGaN/GaN LEDs on a pyramidal patterned sapphire substrate in the microscale (MPSS) and pyramidal patterned sapphire substrate in the nanoscale (NPSS) were grown by metalorganic chemical vapor deposition. The characteristics of the LEDs fabricated on the MPSS and NPSS prepared by wet etching were studied and the light output powers of th… Show more

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Cited by 171 publications
(106 citation statements)
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“…For the same area of the sapphire substrate, a reduced geometrical size of sapphire patterns can increase the number of patterns, and thus increase the opportunity for light scattering from the PSS. (30,31) In addition, a geometrical pattern of a suitable shape and sidewall angle on the sapphire substrate can also increase the reflection of unabsorbed photons resulting in more photogenerated carriers as embedded reflectors, in accordance with Snell's law.…”
Section: Introductionmentioning
confidence: 82%
“…For the same area of the sapphire substrate, a reduced geometrical size of sapphire patterns can increase the number of patterns, and thus increase the opportunity for light scattering from the PSS. (30,31) In addition, a geometrical pattern of a suitable shape and sidewall angle on the sapphire substrate can also increase the reflection of unabsorbed photons resulting in more photogenerated carriers as embedded reflectors, in accordance with Snell's law.…”
Section: Introductionmentioning
confidence: 82%
“…[11][12][13][14] Other optoelectronic devices have been more inclined to employ pattern sapphire substrates (PSS) to enhance light extraction. [18][19][20][21][22] Furthermore, despite costly and complicated growth and fabrication process, there have been reports proposing using diffraction grating on the back of the device for InGaN solar cells to enhance the optical absorption, 23 which combines the textured surface and reflecting substrate. These reports are also consistent with our findings here.…”
Section: Absorptance and Emittancementioning
confidence: 99%
“…The sample was annealed at 860 °C for 90 s under N 2 ambient to form nano-sized Ni clusters. [21][22][23][24] The self-assembled Ni nano-clusters were used as nanoscale etch masks for inductively coupled plasma reactive ion etching (ICP-RIE) of both Devices with and without surface roughening were compared on the same sample by avoiding Ni deposition in half of the sample area. The electroluminescence (EL) spectrum and emission power were measured on-wafer from the top surface of the devices at room temperature using a calibrated Ocean Optics USB 2000 spectrometer coupled with a fiber optic cable.…”
mentioning
confidence: 99%