2018
DOI: 10.1002/macp.201800153
|View full text |Cite
|
Sign up to set email alerts
|

Enhancement of the Photoalignment Stability of Block Copolymer Brushes by Anchor Segments

Abstract: It is known that the use of a homopolymer derived from a relatively high‐surface‐energy block moiety in a diblock copolymer as a substrate can facilitate phase separation of the block copolymer in the form of a layered structure parallel to the substrate. This is an effective approach for preparing a photoresponsive surface molecular brush for liquid‐crystal alignment. However, the alignment of the polymer brushes soon diminishes during elastic deformation of the polymeric substrate due to the weak interaction… Show more

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
1

Citation Types

0
3
0

Year Published

2020
2020
2023
2023

Publication Types

Select...
3

Relationship

2
1

Authors

Journals

citations
Cited by 3 publications
(3 citation statements)
references
References 33 publications
0
3
0
Order By: Relevance
“…Specifically, various fascinating processes such as the simple photochemical process, the rich photoresponsive behaviour, and the miscible ability with other LC materials (Fig. 3c), [57][58][59] which have great influence on the MPS nanostructures of LCBCs. Undoubtedly, such photocontrollable features may bring about unique features along with them.…”
Section: Photocontrollable Liquid-crystalline Block Copolymers (Lcbcs)mentioning
confidence: 99%
See 1 more Smart Citation
“…Specifically, various fascinating processes such as the simple photochemical process, the rich photoresponsive behaviour, and the miscible ability with other LC materials (Fig. 3c), [57][58][59] which have great influence on the MPS nanostructures of LCBCs. Undoubtedly, such photocontrollable features may bring about unique features along with them.…”
Section: Photocontrollable Liquid-crystalline Block Copolymers (Lcbcs)mentioning
confidence: 99%
“…[43][44][45][46][47][48][49][50] As a kind of BCP with specific photoresponsive functions, the photoresponsive LCBC makes it possible to modulate nanopatterns by light, thereby realizing multi-scale, large-area, and high-throughput preparation of nanopatterns, [51][52][53][54][55][56] and applying them to the fabrication and processing of ICs. Furthermore, when one azobenzene (AZ)-containing polymer (azopolymer) is engineered as the mesogenic block of LCBCs, various fascinating processes such as photoalignment, phototriggered molecular cooperative motion, photoinduced phase transition, and even absorbing and transforming light energy can be acquired, [57][58][59][60] which has great influence on the MPS nanostructures of LCBCs. In addition, similar to the photoresist as a photoresponsive material, [61][62][63] the photocontrollable LCBC is responsive to actinic light and can be used as a novel type of photoresist for photolithography processing.…”
Section: Introductionmentioning
confidence: 99%
“…Incorporating a photoresponsive LCP as one segment of block copolymer, photocontrol can be applied to manipulate the MPS nanostructure of polymer film. [71][72][73] When the mesogenic block serves as the continuous phase in LC block copolymer (LCBC), the orientation of MPS nanostructure can be controlled by tuning the polarization direction of the actinic light. [74] For example, linearly polarized light (LPL) at 488 nm is an effective method to control the orientation of poly(ethylene oxide) (PEO) nanocylinders in an amphiphilic LCBC with PEO as the hydrophilic block and one azobenzenecontaining LCP as the hydrophobic block.…”
Section: Photocontrol In Liquid-crystalline Block Copolymermentioning
confidence: 99%