2015
DOI: 10.1109/tns.2015.2498539
|View full text |Cite
|
Sign up to set email alerts
|

Enhancement of Transistor-to-Transistor Variability Due to Total Dose Effects in 65-nm MOSFETs

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
3
1
1

Citation Types

0
7
0

Year Published

2017
2017
2023
2023

Publication Types

Select...
7
1
1

Relationship

0
9

Authors

Journals

citations
Cited by 33 publications
(7 citation statements)
references
References 14 publications
0
7
0
Order By: Relevance
“…On the other hand 3.3 V N-channel transistors did not exhibit any ∆V ot after several MGy and their threshold voltage was only influenced by a limited interface state induced shift (∆V it ) [2]. Such enhanced sensitivity of P-channel MOSFETs has been reported on several technology nodes and foundries [9]- [11] and its root cause, that seems to differ from one node to another, is still under investigation.…”
Section: Experimental Details a The Furhi Sensormentioning
confidence: 90%
See 1 more Smart Citation
“…On the other hand 3.3 V N-channel transistors did not exhibit any ∆V ot after several MGy and their threshold voltage was only influenced by a limited interface state induced shift (∆V it ) [2]. Such enhanced sensitivity of P-channel MOSFETs has been reported on several technology nodes and foundries [9]- [11] and its root cause, that seems to differ from one node to another, is still under investigation.…”
Section: Experimental Details a The Furhi Sensormentioning
confidence: 90%
“…The root cause of this MOSFET variability is linked to manufacturing process variations and it is further studied and discussed in a companion paper [13]. It is worth noting that comparable enhanced variability of CMOS MOSFETs has been recently reported in this TID range in another CMOS process [11], but the physical origin may differ from one process to another.…”
Section: B Analog Readout Chainmentioning
confidence: 99%
“…However, those environments can contain high amounts of ionizing radiation that degrade the silicon transistors' operation, resulting in a reduced performance and increased system noise [3] [4]. Not only does the performance of the circuit typically degenerate due to mismatch [5] and reduced drive strength, also high-energy particles create upsets and transients in circuits where triplication is sometimes difficult to enforce [6] [7].…”
Section: Introductionmentioning
confidence: 99%
“…The FURHI CIS characterization has revealed new imager performance degradation sources due the V th MOSFETs variability. This aspect, addressed in [6] up to TID of 500 Mrad(SiO 2 ) on few tens structures evidenced that variability in the on-current is enhanced due to the impact of random dopant fluctuations on TID effects. However, beyond this work, very little is known about the TID variability of MOSFETs characteristics in the MGy range.…”
Section: Introductionmentioning
confidence: 99%