Enhancing aspect profile of half-pitch 32 nm and 22 nm lithography with plasmonic cavity lens

Gao, Ping; Yao, Na; Wang, Changtao; Zhao, Zeyu; Luo, Yanhong; Wang, Yanqin; Gao, Guohan; Liu, Kaipeng; Zhao, Chengwei; Luo, Xiangang

doi:10.1063/1.4914000

Cited by 146 publications

(101 citation statements)

References 28 publications

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“…Because thin metallic and dielectric films are required to achieve efficient coupling between the SPs at each metal and dielectric interface, similar questions regarding the impacts of the roughness of the mask or the thin film on the pattern quality are raised. Indeed, it has been shown in several studies that film roughness distorts the normal propagation and coupling of waves especially in nanoscale films [14,[19][20][21][22][23], leading to non-uniform PR patterns with poor profiles [24]. All these concerns put critical restrictions on the plasmonic-based lithography for practical applications.…”

Section: Introductionmentioning

confidence: 99%

Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

et al. 2017

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Abstract:The effects of the surface roughness of thin films and defects on photomasks are investigated in two representative plasmonic lithography systems: thin silver film-based superlens and multilayer-based hyperbolic metamaterial (HMM). Superlens can replicate arbitrary patterns because of its broad evanescent wave passband, which also makes it inherently vulnerable to the roughness of the thin film and imperfections of the mask. On the other hand, the HMM system has spatial frequency filtering characteristics and its pattern formation is based on interference, producing uniform and stable periodic patterns. In this work, we show that the HMM system is more immune to such imperfections due to its function of spatial frequency selection. The analyses are further verified by an interference lithography system incorporating the photoresist layer as an optical waveguide to improve the aspect ratio of the pattern. It is concluded that a system capable of spatial frequency selection is a powerful method to produce deep-subwavelength periodic patterns with high degree of uniformity and fidelity.

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Section: Introductionmentioning

confidence: 99%

Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

et al. 2017

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“…4 With the emergence of metamaterials, strenuous research efforts have been made to manipulate the scattering of electromagnetic waves. Transformation optics using gradient-index media is a typical means to make the object inside the region invisible.…”

Section: Introductionmentioning

confidence: 99%

Ultra-wideband manipulation of electromagnetic waves by bilayer scattering engineered gradient metasurface

Guo

Yan

et al. 2018

RSC Adv.

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Realizing effective scattering manipulation in broad operation band is a long pursuit. Here, we present an ultra-broadband metasurface to manipulate the scattering of electromagnetic waves based on spinorbit interaction induced virtual shaping. The spin conversion efficiency is over 90% from 4.9 GHz to 22.8 GHz accompanied by a abrupt phase shift covering 0-2p, which is dependent on the orientation of the subwavelength of building blocks. Both Bessel-and triangular-type virtual profile shapes are developed for electromagnetic illusion and camouflage. Simulation and experimental results demonstrate that the significant backward RCS reduction of 10 dB is obtained from 5.5 to 22.5 GHz. The significant improvement in working bandwidth can be attributed to: the application of the dispersionless phase-shift properties of P-B phase, two-dimensional dispersion management methodology and catenary shaped local field enhancement in the metallic gap. The proposed design may have the potential applications in eletromagnetic manipulation and object detection.

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“…optical lithography system proposed in their work is sophisticated and expensive which would have challenged industrialization. Recently, Gao et al [20] experimentally reported a plasmonic cavity lens to enhance aspect profile and resolution of plasmonic lithography, which is mainly attributed to evanescent waves amplifying from the bottom silver layer and scattering loss reduction with smooth silver films. This technique is also subject to limitation of the mask dimensions.…”

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confidence: 98%

Projecting high depth-to-width aspect ratio of nanolithography with a four-layer metallic waveguide structure

et al. 2015

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The depth-to-width aspect ratio of pattern engineering by surface plasmons is limited for its field intensity exponential attenuation property. We here report a method to enhance patterns' aspect ratio with a maskphotoresist-dielectric-metal four-layer metallic waveguide structure. The parameters, index and thickness, of the dielectric layer are discussed and analyzed to illustrate their affection to the patterns' resolution and aspect ratio. A small thickness of dielectric with its index higher than photoresist will enhance the resolution and aspect ratio of pattern by these proposed structures. Numerical simulation results show that 40 nm half-pitch and 100 nm depth patterns could be performed by a chromium mask with period of 160 nm at the wavelength of 365 nm.High quality of nanoscale patterns is gradually important for the nanoscale science and technology nowadays, especially for the semiconductor device fabrication, integrated circuit, etc. The resolution, as one important factor of high-quality patterns, is fundamentally limited by the physics of diffraction for the traditional optical lithography which is a powerful technique for high-resolution patterning, low-cost and mass-fabrication. Over the past decade, plasmonic lithography [1-16] was available to achieve high resolution beyond the diffraction limit for broadband illuminations for imaging and interference lithography, with the aid of waveguide structure [1-3], superlens [4][5][6][7], plasmonics [8][9][10][11], metamaterials [12,13], surface plasmon generator [14-16], etc. These approaches are all based on the surface plasmons (SPs) for its wavelength is much smaller than that of light in free space at the same frequency [17].

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Enhancing aspect profile of half-pitch 32 nm and 22 nm lithography with plasmonic cavity lens

Cited by 146 publications

References 28 publications

Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

Achieving pattern uniformity in plasmonic lithography by spatial frequency selection

Ultra-wideband manipulation of electromagnetic waves by bilayer scattering engineered gradient metasurface

Projecting high depth-to-width aspect ratio of nanolithography with a four-layer metallic waveguide structure

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