“…Recently, attempts have been made to directly grow h-BN sheets on insulating/dielectric substrates like SiO 2 /Si, Si 3 N 4 /Si, silicon (111), quartz, sapphire, single crystal diamond, and 6H-SiC by employing techniques such as: low-pressure thermal chemical vapor deposition (CVD) ( Behura et al., 2015 , 2017 ; Jang et al., 2016 ; Pendse et al., 2021 ; Tay et al., 2015 ; Wang et al., 2020 ), cold wall chemical vapor deposition ( Ahmed et al., 2016 ), metal organic chemical vapor deposition (MOCVD) ( Majety et al., 2013 ; Vangala et al., 2018 ), molecular beam epitaxy (MBE) ( Page et al., 2019 ) ( Vuong et al., 2017 ), ion beam sputtering deposition (IBSD) ( Gao et al., 2019 ), metal organic vapor phase epitaxy (MOVPE) ( Chugh et al., 2018 ; Yang et al., 2018 , 2020 ), and atomic layer deposition (ALD) ( Lee et al., 2020 ; Park et al., 2017 ). Here we sift through some key techniques and related mechanistic principles to nucleate h-BN crystals on dielectric substrates.…”