1999
DOI: 10.1088/0268-1242/14/8/305
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Epitaxial growth of high-quality ZnS films on sapphire and silicon by pulsed laser deposition

Abstract: We report, for the first time, epitaxial growth of high-quality ZnS films on sapphire and silicon substrates, using pulsed laser deposition. X-ray diffraction results show that at all growth temperatures from 200 • C to 680 • C, epitaxial wurtzite (002) ZnS films have been successfully grown on (10 12) sapphire and (001) silicon substrates. X-ray diffraction data yield full width at half maximum 2θ values of 0.13 • for as-grown samples, compared with 2θ values of 0.09 • and 0.08 • for the bare sapphire and sil… Show more

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Cited by 34 publications
(18 citation statements)
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“…ZnS and Si has lattice mismatch of 0.40 % which is very low compared to other substrates like GaAs, GaP, Ge, and Al 2 O 3 [19]. But, due to thermal expansion difference and polarity, Si is not an ideal match with ZnS and nor are the other substrates mentioned above.…”
Section: Introductionmentioning
confidence: 98%
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“…ZnS and Si has lattice mismatch of 0.40 % which is very low compared to other substrates like GaAs, GaP, Ge, and Al 2 O 3 [19]. But, due to thermal expansion difference and polarity, Si is not an ideal match with ZnS and nor are the other substrates mentioned above.…”
Section: Introductionmentioning
confidence: 98%
“…ii) Silicon is an earth abundant material like ZnS. iii) ZnS has been deposited on Si in several works and many challenges are known [19,24].…”
Section: Introductionmentioning
confidence: 99%
“…It is therefore possible to grow films which otherwise would require a much higher substrate temperature, and which grow under strong non-equilibrium conditions. Even for compounds with volatile elements the thin films usually exhibit optical, electronic and structural properties similar to the bulk [4][5][6][7]. However, for some materials with volatile components such as oxygen or sulfur, a part of the volatile fraction may be lost during the transfer to the substrate or during the film growth [2,8], which, for example, for oxides may lead to "metallic" rather than oxide films [9].…”
Section: Introductionmentioning
confidence: 99%
“…Though some researchers have used H 2 S as background gas for PLD of ZnS [10], other groups have succeeded in using PLD with no background gas or with Ar to make chalcogenide thin films without significant S deficiency or loss of crystallinity, e.g., ZnS, AsS and GeS [5][6][7]11].…”
Section: Introductionmentioning
confidence: 99%
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