Handbook of Crystal Growth 2015
DOI: 10.1016/b978-0-444-63304-0.00013-5
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Epitaxial Growth of Oxide Films and Nanostructures

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Cited by 10 publications
(6 citation statements)
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“…However, photolithography needs to be conducted in labs with an ultra-clean experimental environment and highly skilled operators. 38 Wet-etched patterns are obtained by replacing UV light with an etching solution in the presence of a mask substrate. 39…”
Section: Materials and Approaches For Fabricating Liquid Biopsy Micro...mentioning
confidence: 99%
“…However, photolithography needs to be conducted in labs with an ultra-clean experimental environment and highly skilled operators. 38 Wet-etched patterns are obtained by replacing UV light with an etching solution in the presence of a mask substrate. 39…”
Section: Materials and Approaches For Fabricating Liquid Biopsy Micro...mentioning
confidence: 99%
“…Lithography is a commonly used traditional fabrication process that is relatively complex, costly, and suitable for mass production. The minimum size of graphics produced by lithography can be as small as nanometers, which is suitable for application scenarios that require very high accuracy [ 76 ]. The principle of lithography is to use a photoresist to transfer the pattern from the mask plate to the silicon wafer or other media layer and to obtain a specific pattern shape after exposure and development [ 77 ].…”
Section: Materials and Processes For Fabricating Flexible Sensorsmentioning
confidence: 99%
“…In this process, the photoresist material is irradiated with UV light through a photomask to form the required pattern. 127 In a similar way, a SAM pattern can be formed on the substrate without using a photoresist material by irradiating the SAM layer though the photomask (see Fig. 21).…”
Section: Self-assembled Monolayers For Patterningmentioning
confidence: 99%