2000
DOI: 10.1016/s0925-9635(99)00242-3
|View full text |Cite
|
Sign up to set email alerts
|

Epitaxial Ir layers on SrTiO 3 as substrates for diamond nucleation: deposition of the films and modification in the CVD environment

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
2
2

Citation Types

1
14
0

Year Published

2000
2000
2008
2008

Publication Types

Select...
7
2
1

Relationship

3
7

Authors

Journals

citations
Cited by 35 publications
(15 citation statements)
references
References 6 publications
1
14
0
Order By: Relevance
“…Detailed process conditions are described in Ref. 18. The mosaic spread of the Ir films was in the range between 0.2° and 0.3°, as measured by X-ray diffraction (XRD).…”
Section: Methodsmentioning
confidence: 99%
“…Detailed process conditions are described in Ref. 18. The mosaic spread of the Ir films was in the range between 0.2° and 0.3°, as measured by X-ray diffraction (XRD).…”
Section: Methodsmentioning
confidence: 99%
“…Their size was 10 × 10 mm 2 . Detailed process conditions are described elsewhere [15,16]. The mosaic spread of the Ir films was in the range of 0.1-0.2°as measured by X-ray diffraction (XRD) and the surface consisted of large terraces.…”
Section: Methodsmentioning
confidence: 99%
“…13 Subsequent diamond deposition was done by microwave plasma CVD using the BEN procedure for nucleation. Typical process parameters were 25-60 min biasing at Ϫ250 V, Ϸ700°C, 30 mbar, 1100 W microwave power with 5% CH 4 in H 2 .…”
mentioning
confidence: 99%