1993
DOI: 10.1051/mmm:01993004010500
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Epitaxial orientation of β-FeSi2/Si heterojunctions obtained by RTP chemical vapor deposition

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Cited by 12 publications
(2 citation statements)
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“…3(b)). The former epitaxial relationship has been previously reported [17][18][19], however, the later has been scarcely observed. We think that the melted Si surface contributed to the formation of this unique epitaxial relationship.…”
Section: Crystal Morphology Of Iron-silicidementioning
confidence: 82%
“…3(b)). The former epitaxial relationship has been previously reported [17][18][19], however, the later has been scarcely observed. We think that the melted Si surface contributed to the formation of this unique epitaxial relationship.…”
Section: Crystal Morphology Of Iron-silicidementioning
confidence: 82%
“…This means that the b-FeSi 2 thin film had a (1 0 0)-preferred orientation. The epitaxial growth of (1 0 0)-oriented b-FeSi 2 on the Si(1 0 0) plane by CVD [12,13], MBE [14] and reactive atomic deposition [15] has been reported. The same (1 0 0)-oriented b-FeSi 2 film was also observed on the 3C-SiC(1 0 0) plane although the unit axis of 3C-SiC is smaller than that of Si by 20%.…”
Section: Resultsmentioning
confidence: 99%