Delta-alumina (¤-Al 2 O 3 ) nanopowders and c-plane sapphires (¡-Al 2 O 3 ) were nitridated under a mixed gas flow of nitrogen and methane. The ¤-Al 2 O 3 nanopowders began to be converted to aluminum nitride (AlN) at 1300°C with phase transformation to ¡-Al 2 O 3 but were not completely converted to AlN even after 10 h at 1600°C. The X-ray diffraction pattern and cross-sectional high-resolution transmission electron microscopy image of the nitridated sapphire showed the orientation relationship of AlN[0001]««Al 2 O 3 [0001] in the growth and the formation of an amorphous AlO x N y interlayer between the AlN layer and the sapphire substrate. This formation strongly supported the reaction mechanism in which Al 2 O 3 converts to AlN through solid-state intermediates in the carbothermal reduction and nitridation reaction.©2012 The Ceramic Society of Japan. All rights reserved.Key-words : Aluminum nitride, Alumina, Sapphire, Methane, Carbothermal reduction, TEM [Received May 22, 2012; Accepted July 12, 2012] The carbothermal reduction and nitridation (CRN) method has been used for the commercial preparation of aluminum nitride (AlN) powder from alumina (Al 2 O 3 ) powder under a flow of nitrogen (N 2 ).1) The conventional CRN reaction is expressed by the equation:Al 2 O 3 ðsÞ þ 3CðsÞ þ N 2 ðgÞ ! 2AlNðsÞ þ 3COðgÞ ð1ÞThe method involves the intimate mixing of Al 2 O 3 with carbon powder and the burning up the excess carbon. A previous study showed that gaseous carbon greatly reduces the nitridation temperature of Al 2 O 3 .2) Therefore, Al 2 O 3 powder may be converted to AlN by calcination under a mixed gas of N 2 and methane (CH 4 ) without being mixed with carbon powder because the thermal decomposition of CH 4 gives gaseous carbon.In this note, ¤-Al 2 O 3 nanopowders and sapphires (¡-Al 2 O 3 ) were nitridated under a mixed gas flow of N 2 and CH 4 to examine their conversion to AlN. The reaction system in this study is very similar to that in the CRN method except that Al 2 O 3 powder is not used without being mixed with carbon. To the best of our knowledge, this is the first report on the nitridation of sapphire by the CRN method using an N 2 gas. Most studies on the nitridation of the sapphire surface have been focused on improving the morphological and optical properties of GaN film by reduction of the lattice mismatch between GaN and the sapphire substrate.
3)5)One method to nitridate the sapphire surface prior to GaN growth is to chemically convert the substrate surface using ammonia (NH 3 ) and a nitrogen plasma as nitrogen sources.3)10)The Al 2 O 3 nanopowders (<50 nm, Sigma-Aldrich Co.) in an alumina boat were placed in an alumina tube with an inner diameter of 34 mm and calcined for 10 h under a mixed gas flow of N 2 and CH 4 (0.1 vol %) (hereafter, 0.1 vol % CH 4 /N 2 ) in the temperature range of 13001600°C. The sample was taken from the furnace after it had cooled to room temperature. The gas flow rate and ramping rate were 200 ml/min and 5°C/min, respectively. The c-plane sapphire was cleaned thr...