2015
DOI: 10.1117/12.2178790
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Epitaxially grown vertical junction phase shifters for improved modulation efficiency in silicon depletion-type modulators

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“…However, it requires top-contact electrodes and silicon regrow on the upper surface, which is not compatible with traditional rib waveguides. Although some doping techniques in vertical direction such as in situ doping [48] or alternating implantation and epitaxial overgrowth steps [49] have been proposed, the fabrication process is still complex. Most of researchers choose a horizontal PN junction in the center of the rib waveguide with the same width of P and N areas due to the straightforward fabrication process of the doping profiles, as shown in Fig.…”
Section: Silicon Photonics Mach-zehnder Modulatorsmentioning
confidence: 99%
“…However, it requires top-contact electrodes and silicon regrow on the upper surface, which is not compatible with traditional rib waveguides. Although some doping techniques in vertical direction such as in situ doping [48] or alternating implantation and epitaxial overgrowth steps [49] have been proposed, the fabrication process is still complex. Most of researchers choose a horizontal PN junction in the center of the rib waveguide with the same width of P and N areas due to the straightforward fabrication process of the doping profiles, as shown in Fig.…”
Section: Silicon Photonics Mach-zehnder Modulatorsmentioning
confidence: 99%