Materials Science of Thin Films 2002
DOI: 10.1016/b978-012524975-1/50011-2
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Cited by 45 publications
(60 citation statements)
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“…The Poisson ratio was calculated from the experimental LSMO cell parameters of the fully strained 2.0 nm film measured by high-resolution XRD 2θ/ω scans (out-of-plane c = 3.985 Å; in-plane a = 3.790 Å). Assuming an equilibrium cell structure a = 3.885 Å, the corresponding strains are ε // = −0.0244; ε ⊥ = +0.0257, and the Poisson ratio calculated from the expression for biaxial strain ε ∥ = −(2 v /1 – v )­ε ⊥ was ν = 0.32. Therefore, a critical thickness of h c = 1.7 nm is obtained from eq , which is slightly below the experimental observation.…”
Section: Resultsmentioning
confidence: 99%
“…The Poisson ratio was calculated from the experimental LSMO cell parameters of the fully strained 2.0 nm film measured by high-resolution XRD 2θ/ω scans (out-of-plane c = 3.985 Å; in-plane a = 3.790 Å). Assuming an equilibrium cell structure a = 3.885 Å, the corresponding strains are ε // = −0.0244; ε ⊥ = +0.0257, and the Poisson ratio calculated from the expression for biaxial strain ε ∥ = −(2 v /1 – v )­ε ⊥ was ν = 0.32. Therefore, a critical thickness of h c = 1.7 nm is obtained from eq , which is slightly below the experimental observation.…”
Section: Resultsmentioning
confidence: 99%
“…The dominant growth mechanism for FePt films grown on MgO substrates is 3D island (Volmer-Weber) growth mode considering their surface energy ( γ FePT ~ 2 J m −2 , γ MgO ~ 1.1–1.2 J m −2 ) and large lattice mismatch (~9.6%). In this growth mode, the film becomes continuous only at or above a critical thickness that is influenced by the surface energy and lattice mismatch differences as well as the substrate temperature during deposition 7 . Although a 50–100 nm thickness range has been reported to be a critical thickness for FePt films on (100) MgO deposited at ~973 K 8 , our results show that the thickness of ~100 nm is not sufficient to form a 100% continuous layer with no surface pores for FePt deposition on MgO at 1,023 K.…”
Section: Resultsmentioning
confidence: 99%
“…It is noted that to minimize deviation from the stoichiometry of CaBi 2 Nb 2 O 9 , we chose a moderate sputtering power and an optimal sputtering atmosphere with an Ar/O 2 flow ratio of 4:1. While the former limits the bulk diffusion of the target and hence help maintain its self-compensating mechanism of stoichiometry in a preferential sputtering process, the latter has been proven to yield sputtered peroskite films with both a dense microstructure and a good chemical stoichiometry. , …”
Section: Experimental Sectionmentioning
confidence: 99%