2006 Advanced Signal Processing, Circuit and System Design Techniques for Communications 2006
DOI: 10.1109/aspcas.2006.251127
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ESD (Electrostatic Discharge) Protection Design for Nanoelectronics in CMOS Technology

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Cited by 7 publications
(3 citation statements)
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“…5 were input into relation (1) and equations (2)- (4) and their coefficients as well as the R-square values were determined by multiple regression analysis (Table III). For E model and thermochemical model, the electric field (E) term was also simplified to voltage (V).…”
Section: Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…5 were input into relation (1) and equations (2)- (4) and their coefficients as well as the R-square values were determined by multiple regression analysis (Table III). For E model and thermochemical model, the electric field (E) term was also simplified to voltage (V).…”
Section: Resultsmentioning
confidence: 99%
“…By simulation of pulse voltage, the failure mechanisms of the circuit's breakdown could be investigated. Regarding the voltage pulse causing the damage in CMOS process, the major failures modes include burnt metal, junction damage, and dielectric breakdown [1,2]. The burnt metal failure is resulted from the overloading of metal route current.…”
Section: Introductionmentioning
confidence: 99%
“…This defect mechanism occurs in between the channels of the gate oxide, the emitter, and collector. It is noted that the gate oxide degrades when the dielectric layer wears out due to a strong electric field of 10 MV/CM or above and electrostatic discharge [23]. The gate structure includes a thin oxide layer, which is used to isolate the gate from the MOS transistor, which due to a large voltage spike, emits an avalanche of electrons which causes an immediate breakdown [24].…”
Section: Failure Mechanism Overviewmentioning
confidence: 99%