1996
DOI: 10.1063/1.116657
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Estimation of scattering losses in dielectrically apertured vertical cavity lasers

Abstract: Dielectric apertures, formed by oxidation or wet-etching of high Al content AlGaAs layers in vertical cavity lasers, have recently been used for improved device performance. In this letter an iterative numerical analysis is used to estimate the excess optical losses as the device diameter is reduced. For smaller sizes, where single-mode devices are possible, the optical scattering losses become significant unless the aperture is tapered to approximate a perfect lens or is thin to approximate a weaker waveguide. Show more

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Cited by 70 publications
(24 citation statements)
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“…3, then we can also write (7) Taking the first and the second equation in (4) and the first one in (6), we can eliminate all coefficients relating to the top barrier layer. When we use (7) as well, we obtain a relation of the form (8) which relates the upward propagating fields in the center of the active layer to the downward propagating fields at the same position. Taking the remaining equations in (4) and (6), eliminating the coefficients relating to the lower barrier layer, and taking into account (7), we also find (9) In matrix notation, (8) and (9) can be restated as (10) After eliminating the coefficients, we get the following homogeneous system of equations that has to be solved for a nonzero solution: (11) with the unit matrix.…”
Section: B the Active Region And Formulation Of The Cavity Problemmentioning
confidence: 99%
See 1 more Smart Citation
“…3, then we can also write (7) Taking the first and the second equation in (4) and the first one in (6), we can eliminate all coefficients relating to the top barrier layer. When we use (7) as well, we obtain a relation of the form (8) which relates the upward propagating fields in the center of the active layer to the downward propagating fields at the same position. Taking the remaining equations in (4) and (6), eliminating the coefficients relating to the lower barrier layer, and taking into account (7), we also find (9) In matrix notation, (8) and (9) can be restated as (10) After eliminating the coefficients, we get the following homogeneous system of equations that has to be solved for a nonzero solution: (11) with the unit matrix.…”
Section: B the Active Region And Formulation Of The Cavity Problemmentioning
confidence: 99%
“…In the past, the optical properties of the AlAs-oxide aperture have been looked upon as a position-dependent cavity resonance [7], a position-dependent phase shift [8], or as an intracavity lens counteracting diffraction [9]. All these points of view are based on simple and approximate models, aimed at an intuitive understanding of oxide windows.…”
Section: Introductionmentioning
confidence: 99%
“…This latter calculation represents a numerical solution of the scalar Helmholtz equation describing the cavity modes for the actual device geometry. According to various optical models [40], [41], the oxide apertures, which define the gain region cross section, give rise to significant optical losses in the small devices. The calculated scattering and diffraction losses, together with the condition for lasing threshold give the threshold gain (6) where and are the DBR reflectivities, is the confinement factor, and accounts for the round-trip absorption (scattering) losses.…”
Section: Gain Effects On Thresholdmentioning
confidence: 99%
“…С целью подавления эффекта рассеяния света на границе оксид−полупроводник [31] обычно формируют относительно тонкие селективно-окисленные токовые апертуры, однако это сопряжено с высокими значениям емкости C a p . Уменьшение площади под оксидным слоем за счет уменьшения размера мезы лазера позволяет лишь ча-стично решить проблему, поскольку на практике минимальный диаметр мезы ВИЛ с легированными зеркалами ограничен размером порядка 20 µm, а для ВИЛ с внутрирезонаторными контактами требуются мезы еще большего размера.…”
Section: увеличение паразитной частоты отсечкиunclassified
“…7, b). Сле-дует отметить, что при размерах оксидной токовой апертуры ме-нее 5 µm наблюдаются рост внутренних оптических потерь A int , обусловленных дифракцией света на краях оксидной апертуры [31], и одновременное падение внутренней квантовой эффективности η i из-за роста утечки носителей при повышенной плотности тока [18], что ведет к дополнительному падению дифференциального усиления активной области g N . В результате при малых размерах апертуры растет вклад нелинейности усиления τ g в величину K-фактора.…”
Section: управление временем жизни фотонов в резонатореunclassified