2011
DOI: 10.1016/j.nimb.2011.01.009
|View full text |Cite
|
Sign up to set email alerts
|

Etch-free formation of porous silicon by high-energy ion irradiation

Help me understand this report

Search citation statements

Order By: Relevance

Paper Sections

Select...
1

Citation Types

1
0
0

Year Published

2011
2011
2021
2021

Publication Types

Select...
6

Relationship

0
6

Authors

Journals

citations
Cited by 8 publications
(1 citation statement)
references
References 29 publications
1
0
0
Order By: Relevance
“…Figure 14 indicates the presence of pore structures below the Si substrate. Similar pore production has been reported in literature as a consequence of ion implantation with doses several orders of magnitude larger than the ones we calculate incident upon our photocathode [13], which suggests that our estimate of the total ion dose may be far lower than the actual value. Furthermore, Fig.…”
Section: Remaining Questionssupporting
confidence: 89%
“…Figure 14 indicates the presence of pore structures below the Si substrate. Similar pore production has been reported in literature as a consequence of ion implantation with doses several orders of magnitude larger than the ones we calculate incident upon our photocathode [13], which suggests that our estimate of the total ion dose may be far lower than the actual value. Furthermore, Fig.…”
Section: Remaining Questionssupporting
confidence: 89%