Etching characteristics of TiNi thin film by focused ion beam

Xie, D. Z.; Ngoi, B. K. A.; Fu, Yong Qing; Ong, Alex; Lim, B. H.

doi:10.1016/j.apsusc.2003.09.031

Cited by 16 publications

(9 citation statements)

References 16 publications

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“…The widely used traditional etching methods are wet and dry etching with a precision that does not go far beyond the micrometer scale. , Alternatively, focused ion beam (FIB) etching and gas-assisted electron beam induced etching (EBIE) are structuring techniques at the sub-10 nm scale. ,− FIB often results in unavoidable ion implantation, staining, and surface damage . Although EBIE can avoid such degradation of the material, it requires gas injection and exhaust systems ,, and might lead to contamination with different gaseous precursors. − In addition, surface roughening caused by FIB etching − and EBIE ,− dominates the morphology of the surfaces and limits the structural precision. The precision of 10 nm does not satisfy future needs of nanofabrication where the subnanometer or even atomic scale has to be reached.…”

Section: Resultsmentioning

confidence: 99%

Electron Beam Etching of CaO Crystals Observed Atom by Atom

Shen

Tan

et al. 2017

Nano Lett.

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With the rapid development of nanoscale structuring technology, the precision in the etching reaches the sub-10 nm scale today. However, with the ongoing development of nanofabrication the etching mechanisms with atomic precision still have to be understood in detail and improved. Here we observe, atom by atom, how preferential facets form in CaO crystals that are etched by an electron beam in an in situ high-resolution transmission electron microscope (HRTEM). An etching mechanism under electron beam irradiation is observed that is surprisingly similar to chemical etching and results in the formation of nanofacets. The observations also explain the dynamics of surface roughening. Our findings show how electron beam etching technology can be developed to ultimately realize tailoring of the facets of various crystalline materials with atomic precision.

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Section: Resultsmentioning

confidence: 99%

Electron Beam Etching of CaO Crystals Observed Atom by Atom

Shen

Tan

et al. 2017

Nano Lett.

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“…The FIB has also been used successfully as both an analytical instrument and a means for preparing specimens for sub-sequent analysis by scanning electron microscopy (SEM), transmission electron microscopy (TEM), secondary ion mass spectrometry (SIMS), x-ray photoelectron spectroscopy (XPS), and Auger electron spectroscopy (Dobrzhinetskaya et al 2003, Haswell et al 2003, Mackenzie and Smith 1990, Vasile et al 1999. The FIB has also been proven to pattern materials with nanometer dimensions (Pickard et al 2003, Rubanov and Munroe 2004, Xie et al 2004). In the second half of the 1990s, applications combining in situ FIB sectioning with FIB imaging have attracted significant attention in the materials science community (Phaneuf 1999, Rubanov andMunroe 2004).…”

Section: Introductionmentioning

confidence: 99%

Focused ion beam/scanning electron microscopy studies of Porcellio scaber (Isopoda, Crustacea) digestive gland epithelium cells

Drobne

Milani

Zrimec³

et al. 2006

Scanning

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The focused ion beam (FIB) was used to prepare cross sections of precisely selected regions of the digestive gland epithelium of a terrestrial isopod P. scaber (Isopoda, Crustacea) for scanning electron microscopy (SEM). The FIB/SEM system allows ad libitum selection of a region for gross morphologic to ultrastructural investigation, as the repetition of FIB/SEM operations is unrestricted. The milling parameters used in our work proved to be satisfactory to produce serial two-dimensional (2-D) cuts and/or three-dimensional (3-D) shapes on a submicrometer scale. A final, cleaning mill at lower ion currents was employed to minimize the milling artifacts. After cleaning, the milled surface was free of filament- and ridge-like milling artifacts. No other effects of the cleaning mill were observed.

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“…The same observation (constant sputtering yield) is also reported elsewhere. 18 To obtain vertical sidewall patterning, using a low ion current is preferable to obtain finer ion beams, which can reduce material redeposition. 19,20 C. Incident angle Figure 11 presents an SEM image of rectangular trenches being milled to examine the effect of the ion incident angle on the sputtering yield.…”

Section: 18mentioning

confidence: 99%

Focused-ion beam patterning of organolead trihalide perovskite for subwavelength grating nanophotonic applications

Alias

Dursun²,

Shi³

et al. 2015

Journal of Vacuum Science &Amp; Technology B, Nanotechnology and Microelectronics: Materials, Processing, Measurement, and Phen

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The coherent amplified spontaneous emission and high photoluminescence quantum efficiency of organolead trihalide perovskite have led to research interest in this material for use in photonic devices. In this paper, the authors present a focused-ion beam patterning strategy for methylammonium lead tribromide (MAPbBr3) perovskite crystal for subwavelength grating nanophotonic applications. The essential parameters for milling, such as the number of scan passes, dwell time, ion dose, ion current, ion incident angle, and gas-assisted etching, were experimentally evaluated to determine the sputtering yield of the perovskite. Based on our patterning conditions, the authors observed that the sputtering yield ranged from 0.0302 to 0.0719 μm3/pC for the MAPbBr3 perovskite crystal. Using XeF2 for the focused-ion beam gas-assisted etching, the authors determined that the etching rate was reduced to between 0.40 and 0.97, depending on the ion dose, compared with milling with ions only. Using the optimized patterning parameters, the authors patterned binary and circular subwavelength grating reflectors on the MAPbBr3 perovskite crystal using the focused-ion beam technique. Based on the computed grating structure with around 97% reflectivity, all of the grating dimensions (period, duty cycle, and grating thickness) were patterned with nanoscale precision (>±3 nm), high contrast, and excellent uniformity. Our results provide a platform for utilizing the focused-ion beam technique for fast prototyping of photonic nanostructures or nanodevices on organolead trihalide perovskite.

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Etching characteristics of TiNi thin film by focused ion beam

Cited by 16 publications

References 16 publications

Electron Beam Etching of CaO Crystals Observed Atom by Atom

Electron Beam Etching of CaO Crystals Observed Atom by Atom

Focused ion beam/scanning electron microscopy studies of Porcellio scaber (Isopoda, Crustacea) digestive gland epithelium cells

Focused-ion beam patterning of organolead trihalide perovskite for subwavelength grating nanophotonic applications

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