2016
DOI: 10.1016/j.vacuum.2015.12.023
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Etching of latent tracks in amorphous SiO2 and Si3N4: Simulation and experiment

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Cited by 20 publications
(9 citation statements)
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“…[ 11 ] The conical shape was confirmed by transmission electron microscope studies [ 12,13 ] and atomic‐force microscope. [ 14 ]…”
Section: Experimental Section and Resultsmentioning
confidence: 99%
See 1 more Smart Citation
“…[ 11 ] The conical shape was confirmed by transmission electron microscope studies [ 12,13 ] and atomic‐force microscope. [ 14 ]…”
Section: Experimental Section and Resultsmentioning
confidence: 99%
“…[11] The conical shape was confirmed by transmission electron microscope studies [12,13] and atomic-force microscope. [14] The ECD)of CdTe was conducted using a solution 1 M CdCl 2 þ 1 mM TeO 2 . CdCl 2 was dissolved in water and TeO 2 in a minimal amount of concentrated hydrochloric acid.…”
Section: Experimental Section and Resultsmentioning
confidence: 99%
“…From a fundamental point of view, interest in these materials is due to the possibility of obtaining new knowledge in the field of studying the mechanisms of defect formation, tread formation and radiation resistance of materials [7][8][9]. At the moment, among all nitride ceramics, latent tracks from heavy ions were found in Si 3 N 4 [10,11], while for AlN, the formation of latent tracks was not found, which the authors of [12] determined with a high threshold bias energy for AlN (>34 keV/nm) required to form tracks. In this regard, high resistance to radiation damage, as well as good insulating and heat-conducting properties, make ceramics based on AlN one of the most promising materials in the field of nuclear energy, structural materials for reactor building, dosimetry, etc.…”
Section: Introductionmentioning
confidence: 99%
“…At present, porous matrices based on alumina (Al 2 O 3 ) , titania (TiO 2 ), different polymers are the most frequently used templates for creating nanoobject arrays . However, for many applications it is more interesting to use templates based on silicon derivatives, such as SiO 2 or Si 3 N 4 , which allow to adapt the obtained nanostructures to standard industrial technologies . To obtain silicon oxide templates with pores having diameters from 50 nm, one can use the technology of swift heavy ions, which involves irradiating the material with the subsequent etching of the formed latent tracks in the presence of a selective etching agent.…”
Section: Introductionmentioning
confidence: 99%