The anodic electrochemical behavior of copper in bromide medium, in the absence and presence of hexamethylenetetramine (HMTA), has been studied, using electrochemical and spectroelectrochemical techniques. The copper dissolution in the absence of HMTA was dependent on mass transport of bromide ions. A porous CuBr ®lm was formed at positive overpotentials. The ®lm growth mechanism followed the nucleation, growth and superposition (NGS) model, with instantaneous nucleation and a diusion controlled growth of a three dimensional ®lm. In the presence of the inhibitor, a passivant Cu/HMTA/Br À ®lm was observed. This ®lm has slow growth kinetics, favored by mass transport. The inhibitory eect was observed for the potential range between 0 mV and +800 mV (SCE). A maximum inhibitory eciency, near 100%, was observed for 15 mM HMTA. The nature of the passivant ®lm was con®rmed by in situ surface-enhanced Raman scattering (SERS) and SEM/EDX measurements. #