Evaluating the Topological Surface Properties of Cu/Cr Thin Films Using 3D Atomic Force Microscopy Topographical Maps

Sadeghi, Mohammad; Zelati, Amir; Rezaee, Sahar; Luna, Carlos; Matos, Robert Saraiva; Pires, Marcelo A.; Ferreira, Nilson S.; Filho, Henrique Duarte da Fonseca; Ahmadpourian, Azin; Ţălu, Ștefan

doi:10.3390/coatings12091364

Cited by 9 publications

(4 citation statements)

References 56 publications

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“…These parameters are important parameters used to identify different spatial configurations of the surface microtexture. [ 58 ] Fractal lacunarity is calculated for various box sizes ranging from 1 to 256 pixels. In Figure 6 , a log–log plot of fractal lacunarity versus ε (box size) is utilized to determine the lacunarity coefficient ( β ) from the slope of the regression line.…”

Section: Resultsmentioning

confidence: 99%

Role of Substrate on the Fractal Characteristics of Nanostructure Surfaces of Electrodeposited Nickel Thin Films

Nasehnejad,

Nabiyouni

2024

Physica Status Solidi (b)

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This study investigates the structure, morphological, and roughness properties of electrodeposited nickel thin films grown on different substrates, that is, silicon, copper, and gold. X‐ray diffraction analysis reveals that the Ni coatings exhibit a face‐centered‐cubic phase, regardless of the substrate used, although the texture is mainly influenced by the substrate. Atomic force microscopy images show that larger grains are obtained with gold substrates, while smaller ones are observed with copper and silicon substrates, in agreement with scanning electron microscopy. The results demonstrate that both topological and fractal characteristics of the Ni thin films are significantly influenced by the type of substrate. Statistical parameters are quantified to compare the surface morphology of the different samples. Fractal analysis reveals that the fractal dimensions of all surfaces range between 2 and 3, indicating self‐affinity. Fractal succolarity and lacunarity are measured to assess the penetration of a liquid into the surface and the distribution of gaps in the Ni film surfaces, respectively. Minkowski functionals are utilized for topological analysis to characterize the internal structure of the Ni thin films. The observed differences in roughness characteristics provide evidence that the type of substrate affects the nucleation and growth of surface features during electrodeposition.

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Section: Resultsmentioning

confidence: 99%

Role of Substrate on the Fractal Characteristics of Nanostructure Surfaces of Electrodeposited Nickel Thin Films

Nasehnejad,

Nabiyouni

2024

Physica Status Solidi (b)

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“…Important static parameters such as parameters related to roughness ( S q (RMS) & S a ), maximum peak height ( S p ), maximum valley depth ( S v ), maximum height of surface ( S z ), skewness (Ssk), kurtosis (Sku), and Minkowski functionals (MF's) were investigated and analyzed (Sadeghi et al, 2022). Additionally, the fractal and multifractal dimensions of the film on different metal substrates were drawn and analyzed using MATLAB software.…”

Section: Methodsmentioning

confidence: 99%

“…Images were prepared from different surface areas of the samples randomly with dimensions of 1 μm Â 1 μm, and (256 Â 256) pixels. Then morphological analysis of samples was done using Gwyddion 2.59 and WSxM 50 software according to ISO 25178-2:2012standard (ISO 25178-2:2012Sadeghi et al, 2022).…”

Section: Afm Imagingmentioning

confidence: 99%

“…According to the data in Table 2, it corresponds to the diagram in While the data in Table 1 report important statistical data from the surface of the samples, it is possible to get a better view of the data compared to the analyzed statistics, found in Table 2, with the help of the histogram and the curves of the bearing area of the films versus height (Sadeghi et al, 2022;Zelati et al, 2023).…”

Section: The Statistical Parameters For Samplesmentioning

confidence: 99%

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Investigation of microstructural, micromorphology, and surface plasmon resonance characteristics in Ni/Al, Ni/Cu, and Ni/SS thin films

Mohammadi,

Rezaee,

Nia

et al. 2024

Microscopy Res & Technique

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As the first boundary between the environment and the material, the surface plays an important role in their interaction with each other, therefore, the use of appropriate tools and analysis to examine the mechanical properties and morphology of surfaces has particular importance in industry and research. In this research, a thin film of nickel was deposited on metal substrates made of aluminum, copper, and steel by using the RF magnetic cathode. Then, using a non‐contact atomic force microscope, the morphological properties of the nickel film with static parameters, Minkowski functionals (MF's), fractal, and multifractal were extracted to be analyzed and studied. After that, using parameters such as root mean square (RMS) roughness, skewness, and kurtosis, it was determined how the surface roughness, distribution, and probability density of particles on the film surface alters with the change of the substrate. Next, by examining and analyzing the Δα and Δf parameters obtained from the multifractal section, the morphology of the produced film on the metal substrates was investigated. Then, the change in the surface plasmon resonance (SPR) peak position is changed for the prepared film in the range of the absorption spectrum due to the substrate effect and the microstructural properties of the formed film.Highlights Ni film has been deposited by Rf magnetron sputtering. The effect of metal substrates on the topography, fractality, and optical properties was studied. Minkowski functionals were used to investigate the surface morphology of the samples. Substrate's material and the topography of the formed film can changed the surface plasmon resonance position.

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Morphology and multifractal characteristics of Ag–Cu films with N doping prepared by direct current magnetron sputtering method

Noorbakhsh,

Rezaee,

Arghavani Nia

et al. 2023

Opt Quant Electron

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Evaluating the Topological Surface Properties of Cu/Cr Thin Films Using 3D Atomic Force Microscopy Topographical Maps

Cited by 9 publications

References 56 publications

Role of Substrate on the Fractal Characteristics of Nanostructure Surfaces of Electrodeposited Nickel Thin Films

Role of Substrate on the Fractal Characteristics of Nanostructure Surfaces of Electrodeposited Nickel Thin Films

Investigation of microstructural, micromorphology, and surface plasmon resonance characteristics in Ni/Al, Ni/Cu, and Ni/SS thin films

Morphology and multifractal characteristics of Ag–Cu films with N doping prepared by direct current magnetron sputtering method

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