2008
DOI: 10.1016/j.watres.2008.09.017
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Evaluating UV/H2O2 processes for methyl tert-butyl ether and tertiary butyl alcohol removal: Effect of pretreatment options and light sources

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Cited by 55 publications
(37 citation statements)
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“…In the absence of H 2 O 2 , direct photolysis of the dye (dye + h → products) was slow and resulted in less than 10% azo bond degradation in 60 min which was in agreement with the literature [12]. However, generation of a non-selective and powerful oxidant, • OH radicals [28,29] by direct photolysis of added hydrogen peroxide (H 2 O 2 + h → 2 • OH) significantly enhanced the degradation of the dye, since complete decolorization (dye + • OH → products) was obtained in less than Because of the low molar absorptivity of H 2 O 2 at 254 nm (18.6-19.6 l/mol cm) [30], theoretically an excess of H 2 O 2 is needed to produce more • OH radicals. However in our previous work [31], in addition to other reports [32,33], we observed that the concentration of H 2 O 2 may either enhance or inhibit the photoreaction rate depending on concentration.…”
Section: Effect Of H 2 Omentioning
confidence: 99%
“…In the absence of H 2 O 2 , direct photolysis of the dye (dye + h → products) was slow and resulted in less than 10% azo bond degradation in 60 min which was in agreement with the literature [12]. However, generation of a non-selective and powerful oxidant, • OH radicals [28,29] by direct photolysis of added hydrogen peroxide (H 2 O 2 + h → 2 • OH) significantly enhanced the degradation of the dye, since complete decolorization (dye + • OH → products) was obtained in less than Because of the low molar absorptivity of H 2 O 2 at 254 nm (18.6-19.6 l/mol cm) [30], theoretically an excess of H 2 O 2 is needed to produce more • OH radicals. However in our previous work [31], in addition to other reports [32,33], we observed that the concentration of H 2 O 2 may either enhance or inhibit the photoreaction rate depending on concentration.…”
Section: Effect Of H 2 Omentioning
confidence: 99%
“…These mechanistic models are based on known chemical and photochemical principles and can help understanding the often complex chemical mechanisms. They can be of great value during the design and engineering process [16][17][18][19][20][21][22][23][24]. For this reason, the model discussed in this paper belongs to this group.…”
Section: Omentioning
confidence: 99%
“…Further, the effects of NOM could be included although this was not verified as no new experiments were carried out. A useful application of this model was the optimization and dimensioning of a full-scale UV/H 2 O 2 reactor [23]. Sharpless and Linden [20] investigated NNitrosodimethylamine (NDMA) removal with low-pressure (LP) and medium-pressure (MP) UV lamps.…”
Section: Kinetic Model Applicationsmentioning
confidence: 99%
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