“…1,2 Zirconium nitride (ZrN) thin films are widely used as diffusion barriers in microelectronics, hard coatings on cutting tools or abrasion-resistant layer because of its excellent properties such as high hardness, high melting point, chemical inertness, excellent wear resistance, and good electrical properties. [3][4][5][6] Even though ZrN exhibits about 0.5eV-higher work function than TiN, very little is known about its qualities as capacitor electrode. 7 In the view of high k materials, on the other hand, ZrO 2 film has been spotlighted as new dielectric material in TiN/Insulator/TiN (TIT) capacitor replacing HfO 2 film, due to its high dielectric constant, wide band gap, and thermal stability.…”