Evaporated electron beam lithography resist for non-planar surfaces

Lavallée, Éric; Beauvais, J.; Drouin, Dominique; Kelkar, Prasad; Pan, Yang; Turcotte, David; Cloutier, M.; Legario, Ron

doi:10.1109/imnc.2003.1268621

Cited by 2 publications

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“…A line array with a smaller period was found collapsed because of the capillary force during the drying of the rinsing liquid. The obtained half-pitch of 50 nm is much smaller than the previously reported evaporated resists. − To demonstrate its patterning capability on a nonflat surface, 50 nm PS film was evaporated onto an AFM cantilever and exposed with the same conditions. An array of letters “WIN” (Waterloo Institute for Nanotechnology) with a line width of 34 nm was successfully patterned on an AFM cantilever, as seen in Figure .…”

Section: Resultsmentioning

confidence: 99%

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Electron Beam Lithography on Irregular Surfaces Using an Evaporated Resist

2014

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An electron beam resist is typically applied by spin-coating, which cannot be reliably applied on nonplanar, irregular, or fragile substrates. Here we demonstrate that the popular negative electron beam resist polystyrene can be coated by thermal evaporation. A high resolution of 30 nm half-pitch was achieved using the evaporated resist. As a proof of concept of patterning on irregular surfaces, we fabricated nanostructures on the AFM cantilever and the optical fiber. Although an ice (H2O) resist has also been recently demonstrated as being capable of nanopatterning on irregular and fragile substrates, it requires specially designed accessories mounted inside a SEM chamber, whereas our process works with any thermal evaporator and is thus simpler and much more accessible. Nanofabrication on nonplanar surfaces may find applications in fields such as (AFM) tip-enhanced Raman spectroscopy for chemical analysis and lab-on-fiber technology.

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Section: Resultsmentioning

confidence: 99%

“…Eric et al . have developed a negative evaporated sterol resist, named QSR-5, which was employed to pattern on an optical fiber and laser diode facet, as well as on the backside of membranes for the fabrication of an X-ray mask. − Yet, in addition to its moderate resolution, this specially formulated resist is not commercially available. Daniel et al .…”

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Electron Beam Lithography on Irregular Surfaces Using an Evaporated Resist

2014

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“…However, this method cannot uniformly coat the bottom of a rod or the faces of other types of 3D substrates. Spraying or evaporating resist material seems to be appropriate for a curving surface or a surface with a step [5,6]. However, the resist particles move towards substrates from one direction, which limit the uniformity for 3D/deep structures.…”

Section: Introductionmentioning

confidence: 99%

New Resist-Coating Technique Using Fine Mist for Three-Dimensional Nanotechnology

Yamazaki

Namatsu

19th IEEE International Conference on Micro Electro Mechanical Systems

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We have devised a new resist-coating technique for three-dimensional (3D) substrates. The technique uses a quasi-static ambient of very fine mist and enables us to coat a resist film on a 3D substrate such as a cube. We found good conditions for obtaining a resist film with a uniform thickness and smooth surface and succeeded in coating polymethylmethacrylate on a SiO 2 /Si cube. Moreover, electron-beam (EB) lithography on the cube resulted in similar patterns on each face of the top and side faces. This technique promises to enable 3D nanofabrication of various materials such as silicon with the resolution of EB lithography.

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Evaporated electron beam lithography resist for non-planar surfaces

Cited by 2 publications

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Electron Beam Lithography on Irregular Surfaces Using an Evaporated Resist

Electron Beam Lithography on Irregular Surfaces Using an Evaporated Resist

New Resist-Coating Technique Using Fine Mist for Three-Dimensional Nanotechnology

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