1993
DOI: 10.1016/0022-0248(93)90267-z
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Evidence for strain relaxation via composition fluctuations in strained quaternary / quaternary and quaternary / ternary multiple quantum well structures

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Cited by 16 publications
(7 citation statements)
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“…The strain compensated structures also show an anisotropic behavior, with strong thickness modulations along the [011] direction. Our results confirm the anisotropic behavior of strain compensated structures obtained by Gas Source Molecular Beam Epitaxy (GSMBE) 4 and LP-MOVPE 5,6 .…”
Section: Introductionsupporting
confidence: 85%
“…The strain compensated structures also show an anisotropic behavior, with strong thickness modulations along the [011] direction. Our results confirm the anisotropic behavior of strain compensated structures obtained by Gas Source Molecular Beam Epitaxy (GSMBE) 4 and LP-MOVPE 5,6 .…”
Section: Introductionsupporting
confidence: 85%
“…In the literature TEM measurements have been used to determine the transition between a 2D and 3D growth regime and the relaxation mechanisms that can occur in MQW stacks for settle high strains, as a function of the growth temperature [22,23]. In the cross-sectional TEM analyses carried out on these samples, no evident waving or relaxation pathways have been found.…”
Section: Article In Pressmentioning
confidence: 97%
“…A few attempts have been made in order to improve the material quality of NGW150. These samples have been grown to repeat experiments previously reported in the literature: the InP or quaternary material insertions between well and barrier or growth interruptions were used to improve the interface abruptness damaged by the high strain [12][13][14][15][21][22][23]. Neither the introduction of InP monolayers (NGW 152) nor 1-s growth interruption (NGW 153) improved the material quality.…”
Section: Article In Pressmentioning
confidence: 99%
“…This behavior follows the degradation trend reported for wavy layer growth in previous studies. 4,8 However, the band B was absent from PL spectra of single quaternary layers of compressive and tensile strained materials. 14 We speculate that this band is possibly related to defects generated at the barriers and wells interfaces by the onset of wavy layer growth.…”
Section: Resultsmentioning
confidence: 97%
“…Nevertheless, they exhibit partial elastic relaxation prior to the generation of misfit dislocations through the formation during growth of step bunching over terraces 3 and three dimensional growth. 4 In addition, the growth of tensile strained barrier layers may be affected by the miscibility gap of the quaternary InGaAsP material, 5,6 because the solid alloy is unstable for a range of compositions and growth temperatures. Such relaxation mechanisms produce undulations at the ZNS-MQW interfaces, which have been attributed to thickness, strain and compositional modulations.…”
Section: Introductionmentioning
confidence: 99%