2015
DOI: 10.1038/srep13599
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Evidence of Filamentary Switching in Oxide-based Memory Devices via Weak Programming and Retention Failure Analysis

Abstract: Further progress in high-performance microelectronic devices relies on the development of novel materials and device architectures. However, the components and designs that are currently in use have reached their physical limits. Intensive research efforts, ranging from device fabrication to performance evaluation, are required to surmount these limitations. In this paper, we demonstrate that the superior bipolar resistive switching characteristics of a CeO2:Gd-based memory device can be manipulated by means o… Show more

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Cited by 40 publications
(19 citation statements)
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“…Most resistive random‐access memory (RRAM) devices are based on a plethora of inorganic materials, including binary oxides, perovskite oxides, nitrides, and chalcogenides. [ 238–247 ] Recently, the emerging perovskites are considered as competitive materials for low cost wafer‐scale [ 248 ] and highly mechanical‐flexible RRAM devices. [ 249 ] The most common perovskite used for RRAM applications are 3D perovskites including MAPbI 3 , [ 22,225,227,235,250–259 ] MAPbCl 3 , MAPbBr 3 , [ 260,261 ] and CsPbBr 3 .…”
Section: Rs Memories Based On Halide Perovskitesmentioning
confidence: 99%
“…Most resistive random‐access memory (RRAM) devices are based on a plethora of inorganic materials, including binary oxides, perovskite oxides, nitrides, and chalcogenides. [ 238–247 ] Recently, the emerging perovskites are considered as competitive materials for low cost wafer‐scale [ 248 ] and highly mechanical‐flexible RRAM devices. [ 249 ] The most common perovskite used for RRAM applications are 3D perovskites including MAPbI 3 , [ 22,225,227,235,250–259 ] MAPbCl 3 , MAPbBr 3 , [ 260,261 ] and CsPbBr 3 .…”
Section: Rs Memories Based On Halide Perovskitesmentioning
confidence: 99%
“…As it can go through repeatable redox (Ce +3 /Ce +4 ) cycles based on reduction of cerium from Ce +4 to Ce +3 . Importance of CeO 2 is not only due to accepting/discharging oxygen ions but also due to the valency change between Ce +4 to Ce +3 states91011.…”
mentioning
confidence: 99%
“…In fact, there are many factors that affect the formation and disruption of conductive filaments, including electrode size, electrode activity, and functional layer thickness . On the other hand, different materials have different storage mechanisms for memory devices.…”
Section: Filament Mechanisms Of Rram Devicesmentioning
confidence: 99%