Evidence of Si–OH species at the surface of aged silica

Paparazzo, E.; Fanfoni, M.; Severini, E.; Priori, S.

doi:10.1116/1.577726

Cited by 61 publications

(38 citation statements)

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“…Using X-rays from a synchrotron source, such features were also observed in the high-resolution Si 2p spectrum of a silicon wafer at ca. 105.2 eV, while Si-O-Si bonds were found at 103.8 eV [21]. Conventional XPS studies are not suitable to show the presence of those surface groups (Figs 2 and 3) [21].…”

Section: Resultsmentioning

confidence: 96%

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X-ray photoelectron spectroscopy for detection of the different Si–O bonding states of silicon

et al. 2003

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X-ray photoelectron spectroscopy (XPS) was used to detect the bonding between a silica particle surface and attached silanes. In addition to the commonly recorded Si 2p spectrum, the Si 1 s level is also accessible when monochromatic Ag Lalpha X-rays are applied. Furthermore, the spectrum of the Si 1 s level shows a fine structure. After spectrum deconvolution, we assigned the fitted spectral peaks to Si-C bonds of the silanes and to the Si-O bonds of the silica network. The recorded Si 1 s spectra were deconvoluted into peaks originating from Si-C bonds and the Si-O-Si silica network. To check the results of spectrum deconvolution, several differently functionalized silanes containing stoichiometric amounts of heteroatoms were applied for silica surface modification. We conclude that spectra deconvolution of the Si 1 s signal is an appropriate means for quantification of surface attached silane molecules.

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Section: Resultsmentioning

confidence: 96%

“…105.2 eV, while Si-O-Si bonds were found at 103.8 eV [21]. Conventional XPS studies are not suitable to show the presence of those surface groups (Figs 2 and 3) [21].…”

Section: Resultsmentioning

confidence: 96%

X-ray photoelectron spectroscopy for detection of the different Si–O bonding states of silicon

et al. 2003

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“…By use of X-rays from a synchrotron source, the presence of Si-OH groups has been observed in a high-resolution Si 2p spectrum of a silicon wafer at ca. 105.2 eV, while Si-O-Si bonds were found at 103.8 eV [20,21]. Conventional XPS studies are not suitable to determine the presence of those surface groups [19,20].…”

Section: Si 2p Binding Energiesmentioning

confidence: 99%

“…Normally the peak ascribed to siloxane (Si-O-Si) bonds corresponding to the silicon skeleton in microsilica and the peak ascribed to silanol (Si-OH) bonds are reported to be located at 532 and 533 eV, respectively [7,12,20]. The peak corresponding to non-bridging oxygen is reported to be located at lower binding energies.…”

Section: Si 2p Binding Energiesmentioning

confidence: 99%

XPS and FT-IR investigation of silicate polymers

Simonsen

Sønderby

Li³

et al. 2009

J Mater Sci

194

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This article presents the results of an investigation of the compositional and structural features of an inorganic polymer synthesized from amorphous silica and KOH. The inorganic polymers were characterized using Fourier transformation infrared spectroscopy (FT-IR), X-ray photoelectron spectroscopy (XPS), scanning electron microscopy (SEM) and X-ray diffraction (XRD). FT-IR investigation of the inorganic polymers showed that an increase in the hydroxide concentration used in the synthesis shifts the position of the maximum absorbance of Si-O bands toward lower wave numbers, indicating the transformation of Q 4 units to Q 3 and Q 2 units. XPS investigation of the inorganic polymers showed that the total amount of oxygen and potassium present in the sample increased when higher concentrations of hydroxide were used in the synthesis. The O/Si ratio of the inorganic polymers changed from 2 to 2.6 when the KOH concentration was increased from 0.75 to 4 M. The increase in the O/Si ratio can be explained by the greater dissolution of SiO 2 particles leading to the formation of branched polymers and gelation.

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“…This binding energy at 103.5 eV is typical for Si-O bonds of SiO surfaces [26][27][28]. The second component peak (G) in the Si 2p spectrum of PCPD-silica is shifted by (13) …”

Section: X-ray Photoelectron Spectroscopymentioning

confidence: 99%

The versatile surface properties of poly(cyclopentadiene)-modified silica particles (PCPD-silica): XPS and electrokinetic studies

Simon

Jacobasch

Spange

1998

Colloid & Polymer Science

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Surface properties of poly(cyclopentadiene)-silica hybrid particles (PCPD-silica) were studied by means of XPS and electrokinetic measurements. The surfaces of PCPD-silica particles exhibit two different areas with different properties: bare silica holes and PCPD patches. The PCPD chains contain different functional groups such as alcohol and carbonyl groups that were identified by XPS. The PCPD chains are grafted covalently onto the silica surface via Si-O-C bonds created by the reaction of silanol groups and active PCPD chains. The amount of Si-O-C was examinated by means of XPS.The Br+nsted acidity of the residual silanol groups was determined by means of electrokinetic measurements. It was found that the pK values of the residual silanol groups increase with increasing polymer content on the particle surface.The surface acceptor strengths of the hybrid particles in non-aqueous liquids were investigated by the solvatochromic indicator bis(1,10-phenanthroline)-cis-dicyano-iron-II in 1,2-dichloroethane.

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Evidence of Si–OH species at the surface of aged silica

Cited by 61 publications

References 0 publications

X-ray photoelectron spectroscopy for detection of the different Si–O bonding states of silicon

X-ray photoelectron spectroscopy for detection of the different Si–O bonding states of silicon

XPS and FT-IR investigation of silicate polymers

The versatile surface properties of poly(cyclopentadiene)-modified silica particles (PCPD-silica): XPS and electrokinetic studies

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