Evolution of crystal structure of Zn:N films under high temperature

Abstract

Zinc-nitrogen (Zn:N) compound thin film was prepared from a pure metallic Zn target by rf magnetron sputtering at ambient temperature under the mixture of nitrogen and argon gases with the ratio of 1:1. High temperature x-ray diffraction (HTXRD) measurement under vacuum was used to examine the evolution of structural properties of the Zn:N film. At ambient temperature, the (002), (100), and (101) planes corresponding to Zn structure were observed while at higher temperature, the left shifts corresponding to the increase of lattice constants a and c of Zn were observed. At temperatures of 320 °C, 481 °C and 554 °C, the (222), (321) and (400) planes corresponding to Zn 3 N 2 structure were observed with the decrease in the intensity amplitudes of the peaks belonging to the Zn structure. The results indicate the gradual transformation of the Zn 3 N 2 phase in the Zn:N films at temperature greater than 320 °C.