Evolution of Structural, Morphological, Mechanical and Optical properties of TiAlN coatings by Variation of N and Al amount

Asgary, Somayeh; Ghoranneviss, M.; Mahmoodi, A.; Zarein-Dolab, Saeed

doi:10.1007/s10904-017-0603-z

Cited by 9 publications

(4 citation statements)

References 58 publications

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“…In solid solution, the Al atoms replace the Ti atoms in the TiN crystal lattice. Since Al (R Al = 0.143 nm) has a smaller atomic radius than Ti (R Ti = 0.147 nm) 30 , the replacement of Ti atoms with Al atoms leads to a decrease in the lattice parameter of the unit cell Ti (1-x) Al x N, and the diffraction lines shift to higher values 2θ 31,32 . The Ti (1-x) Al x N phase with the FCC structure (space group 225) is usually formed in Ti (1-x) Al x N films whose Al content is less than 0.65.…”

Section: Crystallographic Texturementioning

confidence: 99%

Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering

2023

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Thin films of titanium aluminum nitride (Ti (1-x) Al x N) were deposited on silicon, copper, and plasma nitrided AISI D2 tool steel substrates through reactive direct current grid-assisted magnetron sputtering. The depositions were performed in the metal and compound modes using nitrogen flow rates of (7.2 ± 0.1) sccm and (6.8 ± 0.2) sccm, respectively. The relations between the process parameters and the crystallographic orientation were investigated. Chemical and mechanical properties were characterized by X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), scanning electron microscopy (SEM), transmission electron microscopy (TEM), and instrumented indentation technique (IIT). X-ray diffraction spectra and electron diffraction patterns revealed the presence of a Ti (1-x) Al x N phase with a face-centered cubic structure in both films. In metal mode, the coatings exhibited a preferential (111) plane orientation, changing to (200) in the compound mode. The change in preferential orientation was influenced by the reactive gas partial pressure.

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Section: Crystallographic Texturementioning

confidence: 99%

Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering

2023

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“…When the Al/Ti atomic ratio increases to 0.54, the AlN (002) peak becomes sharp. The increase in the Al target current leads to an increase in the sputtering intensity of the energetic ions, resulting in more plasma [3]. As the Al content increases, it is difficult for Al atoms to enter the TiN lattice.…”

Section: X-ray Diffractionsmentioning

confidence: 99%

“…With the further increase of Al target power, under the continuous bombardment of highenergy Ar + on the Al cathode target, the low melting point Al target may emit Al atoms with a higher density and the Al atoms continue to compete with each other for nucleation and growth. Grains with the lowest surface energy include more materials and grow on grains with highest surface energy due to the migration of Al atoms between neighboring grains [3]. As a result, small particles on the surface of the high Al content (Ti, Al)N films aggregate into a large particle structure.…”

Section: Microstructurementioning

confidence: 99%

“…In the past few decades, transition metal nitride films modify the surface properties of substrate materials as a protective material for cutting tools. The deposition of nitride hard films on the surface of high-speed machining tools by magnetron sputtering was widely used in the metalworking industry due to its high hardness, good wear resistance, oxidation resistance and corrosion resistance [1][2][3]. For many years, TiN has been used widely for cutting tools and wear-resistant parts as the first generation of hard films [4].…”

Section: Introductionmentioning

confidence: 99%

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Tribological properties of (Ti, Al)N films with different Al/Ti atomic ratios deposited by magnetron sputtering

Liu

Zhang

et al. 2022

Mater. Res. Express

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Magnetron sputtering was used to deposit (Ti, Al)N films with different Al/Ti atomic ratios by changing the current of the Al target and to study their tribological properties. The phase composition, microstructure and elemental distribution of films were characterized by X-ray diffraction (XRD), scanning electron microscopy (SEM), X-ray photoelectron spectroscopy (XPS) and energy dispersive spectroscopy (EDS). The influence of the ratio between Al and Ti atoms on the tribological properties and the mechanical properties of the films was analyzed. The conclusions showed that there was a tendency for films to shift from the crystalline to the amorphous state as the Al/Ti atomic ratio increases. Herein, changes in film microhardness were related to the substitution relationship between Ti atoms and Al atoms. Especially, when the Al/Ti atomic ratio was 0.54, coefficient of friction (COF) and specific wear rate were the lowest. Compared with TiN film, (Ti, Al)N films have higher microhardness due to the solid solution hardening caused by the substitution between Al and Ti atoms to produce lattice distortion. These factors make films have excellent tribology performance.

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Effect of reactive gas flow on structural and optical properties of sputtered silver oxide thin films; Kramers-Kronig method

Asgary

2022

Opt Quant Electron

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Evolution of Structural, Morphological, Mechanical and Optical properties of TiAlN coatings by Variation of N and Al amount

Cited by 9 publications

References 58 publications

Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering

Change with the Reactive Deposition Mode in Crystallographic and Mechanical Properties of Titanium Aluminum Nitride Coatings Obtained Via Grid-Assisted Magnetron Sputtering

Tribological properties of (Ti, Al)N films with different Al/Ti atomic ratios deposited by magnetron sputtering

Effect of reactive gas flow on structural and optical properties of sputtered silver oxide thin films; Kramers-Kronig method

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