2020
DOI: 10.1063/5.0007293
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Evolutions of optical constants, interband electron transitions, and bandgap of Sn-doped CH3NH3PbI3 perovskite films

Abstract: CH3NH3PbI3 (MAPbI3) perovskite materials hold considerable promise for future low cost, high-efficiency solar cells, and replacement materials for toxic lead have also been in demand. In this study, the optical constants, absorption coefficients, and interband electron transitions of MAPb1−xSnxI3 (x = 0, 0.4, 0.8, and 1) films have been analyzed by spectroscopic ellipsometry in the photon range of 1 eV–5 eV. The bandgaps of MAPb1-xSnxI3 (x = 0, 0.4, 0.8, 1) are 1.54 eV, 1.51 eV, 1.49 eV, and 1.46 eV, respectiv… Show more

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Cited by 6 publications
(8 citation statements)
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“…The variation in “k” is due to doping, which refers to the change in the density of the film. This variation in “k” refers to a red shift, which is due to inter-band electronic transition when the Bi–Sn are co-doped in MAPbI 3 film [ 51 ]. The variation in inter-band electronic transition reflects the change in band structures, which confirms the substitution of Sn and Bi in the place of Pb in MAPbI 3 structures.…”
Section: Resultsmentioning
confidence: 99%
“…The variation in “k” is due to doping, which refers to the change in the density of the film. This variation in “k” refers to a red shift, which is due to inter-band electronic transition when the Bi–Sn are co-doped in MAPbI 3 film [ 51 ]. The variation in inter-band electronic transition reflects the change in band structures, which confirms the substitution of Sn and Bi in the place of Pb in MAPbI 3 structures.…”
Section: Resultsmentioning
confidence: 99%
“…The prominent absorption peak of ε 2 near 380 nm is red-shifted with the doped Sn elements. The reason is that MASnI 3 appears to have a stronger s – p antibonding coupling near the VBM than MAPbI 3 , which results in a higher VBM and, thus, a lower bandgap. The high electronegativity of the Sn element is also responsible for the optical absorption red shift .…”
Section: Resultsmentioning
confidence: 99%
“…The surface morphologies were then measured using AFM in tapping mode by HR Evo Nano (Figure b,c). The surface roughness was 95 ± 5 nm (RMS roughness), which is sufficient to meet SE requirements . Before ellipsometric measurement, the sample was cleaned with the model KQ5200SE ultrasonic machine to remove impurities.…”
Section: Experimental and Computational Methodologymentioning
confidence: 99%
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